Properties of Oxide Film Atomic Layer Deposited from Tetraethoxy Silane, Hafnium Halides, and Water
2004 ◽
Vol 151
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pp. F98
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2011 ◽
Vol 257
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pp. 7305-7309
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2021 ◽
Vol 39
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pp. 032406
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2016 ◽
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pp. 1600330
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2020 ◽
Vol 124
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pp. 18156-18164
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2011 ◽
Vol 334
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pp. 126-133
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