Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
2021 ◽
Vol 39
(3)
◽
pp. 032406
Keyword(s):
2015 ◽
Vol 46
(S1)
◽
pp. 52-52
◽
Keyword(s):
Keyword(s):
2016 ◽
Vol 63
(9)
◽
pp. 3558-3561
◽
Keyword(s):
2014 ◽
Vol 35
(12)
◽
pp. 1266-1268
◽
1999 ◽
Vol 1
(5)
◽
pp. 215
◽
2008 ◽
Vol 130
(38)
◽
pp. 12580-12581
◽
Keyword(s):
2014 ◽
Vol 61
(1)
◽
pp. 73-78
◽
Keyword(s):
2010 ◽
Vol 13
(5)
◽
pp. H141
◽
Keyword(s):