Film stacking architecture for immersion lithography process

2008 ◽  
Author(s):  
Tomohiro Goto ◽  
Masakazu Sanada ◽  
Tadashi Miyagi ◽  
Kazuhito Shigemori ◽  
Masashi Kanaoka ◽  
...  
Keyword(s):  
Immersion Lithography ◽  
Lithography Process

Multilayer BARCs for hyper-NA immersion lithography process

2007 ◽  
Author(s):  
Yasushi Sakaida ◽  
Satoshi Takei ◽  
Makoto Nakajima ◽  
Shigeo Kimura ◽  
Takahiro Sakaguchi ◽  
...  
Keyword(s):  
Immersion Lithography ◽  
Lithography Process

Wafer Edge Process Integration and Defect Inspection with the Immersion Lithography Process

2014 ◽  
Vol 60 (1) ◽  
pp. 847-853 ◽  
Author(s):  
Q. Ni ◽  
H. Chen ◽  
K. Wang ◽  
Y. Long ◽  
R. Fang
Keyword(s):  
Process Integration ◽  
Defect Inspection ◽  
Immersion Lithography ◽  
Lithography Process ◽  
Edge Process ◽  
Wafer Edge

scholarly journals Low-loss, flat-topped and spectrally uniform silicon-nanowire-based 5th-order CROW fabricated by ArF-immersion lithography process on a 300-mm SOI wafer

2013 ◽  
Vol 21 (25) ◽  
pp. 30163 ◽  
Author(s):  
Seok-Hwan Jeong ◽  
Daisuke Shimura ◽  
Takasi Simoyama ◽  
Miyoshi Seki ◽  
Nobuyuki Yokoyama ◽  
...  
Keyword(s):  
Silicon Nanowire ◽  
Low Loss ◽  
Immersion Lithography ◽  
Lithography Process

Influence of the watermark in immersion lithography process

2005 ◽  
Author(s):  
Daisuke Kawamura ◽  
Tomoyuki Takeishi ◽  
Koutarou Sho ◽  
Kentarou Matsunaga ◽  
Naofumi Shibata ◽  
...  
Keyword(s):  
Immersion Lithography ◽  
Lithography Process

Si-nanowire-based multistage delayed Mach–Zehnder interferometer optical MUX/DeMUX fabricated by an ArF-immersion lithography process on a 300  mm SOI wafer

2014 ◽  
Vol 39 (13) ◽  
pp. 3702 ◽  
Author(s):  
Seok-Hwan Jeong ◽  
Daisuke Shimura ◽  
Takasi Simoyama ◽  
Tsuyoshi Horikawa ◽  
Yu Tanaka ◽  
...  
Keyword(s):  
Zehnder Interferometer ◽  
Si Nanowire ◽  
Immersion Lithography ◽  
Lithography Process ◽  
Mach Zehnder Interferometer
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