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Transfer mechanism of defects on topcoat to resist pattern in immersion lithography process and effects on etching process
Mapping Intimacies
◽
10.1117/12.711281
◽
2007
◽
Cited By ~ 1
Author(s):
Nobuhiro Takahashi
◽
Satoru Shimura
◽
Tetsu Kawasaki
Keyword(s):
Transfer Mechanism
◽
Etching Process
◽
Immersion Lithography
◽
Lithography Process
Download Full-text
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Characterization of film cut position at wafer bevel for effective immersion lithography process
10.1117/12.813376
◽
2009
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Author(s):
Kazuyuki Matsumaro
◽
Miyoshi Seki
◽
Takeshi Kato
Keyword(s):
Immersion Lithography
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Lithography Process
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a novel positive tone development method for defect reduction in the semiconductor 193 nm immersion lithography process
Optical Microlithography XXXI
◽
10.1117/12.2297280
◽
2018
◽
Author(s):
Li Li
◽
Xuan Liu
◽
David Conklin
◽
Tafsirul Islam
Keyword(s):
Defect Reduction
◽
Development Method
◽
Immersion Lithography
◽
Lithography Process
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193 Nm
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Multilayer BARCs for hyper-NA immersion lithography process
10.1117/12.711382
◽
2007
◽
Cited By ~ 3
Author(s):
Yasushi Sakaida
◽
Satoshi Takei
◽
Makoto Nakajima
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Shigeo Kimura
◽
Takahiro Sakaguchi
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...
Keyword(s):
Immersion Lithography
◽
Lithography Process
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Wafer Edge Process Integration and Defect Inspection with the Immersion Lithography Process
ECS Transactions
◽
10.1149/06001.0847ecst
◽
2014
◽
Vol 60
(1)
◽
pp. 847-853
◽
Cited By ~ 1
Author(s):
Q. Ni
◽
H. Chen
◽
K. Wang
◽
Y. Long
◽
R. Fang
Keyword(s):
Process Integration
◽
Defect Inspection
◽
Immersion Lithography
◽
Lithography Process
◽
Edge Process
◽
Wafer Edge
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Film stacking architecture for immersion lithography process
10.1117/12.772411
◽
2008
◽
Author(s):
Tomohiro Goto
◽
Masakazu Sanada
◽
Tadashi Miyagi
◽
Kazuhito Shigemori
◽
Masashi Kanaoka
◽
...
Keyword(s):
Immersion Lithography
◽
Lithography Process
Download Full-text
Low-loss, flat-topped and spectrally uniform silicon-nanowire-based 5th-order CROW fabricated by ArF-immersion lithography process on a 300-mm SOI wafer
Optics Express
◽
10.1364/oe.21.030163
◽
2013
◽
Vol 21
(25)
◽
pp. 30163
◽
Cited By ~ 47
Author(s):
Seok-Hwan Jeong
◽
Daisuke Shimura
◽
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Miyoshi Seki
◽
Nobuyuki Yokoyama
◽
...
Keyword(s):
Silicon Nanowire
◽
Low Loss
◽
Immersion Lithography
◽
Lithography Process
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Low-loss and flatband silicon-nanowire-based 5th-order coupled resonator optical waveguides (CROW) fabricated by ArF-immersion lithography process on a 300-mm SOI wafer
10.1117/12.2038793
◽
2014
◽
Author(s):
Seok-Hwan Jeong
◽
Daisuke Shimura
◽
Takasi Simoyama
◽
Miyoshi Seki
◽
Nobuyuki Yokoyama
◽
...
Keyword(s):
Optical Waveguides
◽
Silicon Nanowire
◽
Low Loss
◽
Immersion Lithography
◽
Lithography Process
◽
Coupled Resonator
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Development of materials and processes for double patterning toward 32- nm node 193- nm immersion lithography process
10.1117/12.771773
◽
2008
◽
Cited By ~ 11
Author(s):
Shinji Tarutani
◽
Hideaki Tsubaki
◽
Shinichi Kanna
Keyword(s):
Immersion Lithography
◽
Lithography Process
◽
Double Patterning
◽
193 Nm
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Influence of the watermark in immersion lithography process
10.1117/12.599314
◽
2005
◽
Cited By ~ 5
Author(s):
Daisuke Kawamura
◽
Tomoyuki Takeishi
◽
Koutarou Sho
◽
Kentarou Matsunaga
◽
Naofumi Shibata
◽
...
Keyword(s):
Immersion Lithography
◽
Lithography Process
Download Full-text
Si-nanowire-based multistage delayed Mach–Zehnder interferometer optical MUX/DeMUX fabricated by an ArF-immersion lithography process on a 300 mm SOI wafer
Optics Letters
◽
10.1364/ol.39.003702
◽
2014
◽
Vol 39
(13)
◽
pp. 3702
◽
Cited By ~ 34
Author(s):
Seok-Hwan Jeong
◽
Daisuke Shimura
◽
Takasi Simoyama
◽
Tsuyoshi Horikawa
◽
Yu Tanaka
◽
...
Keyword(s):
Zehnder Interferometer
◽
Si Nanowire
◽
Immersion Lithography
◽
Lithography Process
◽
Mach Zehnder Interferometer
Download Full-text
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