Development of materials and processes for double patterning toward 32- nm node 193- nm immersion lithography process

2008 ◽  
Author(s):  
Shinji Tarutani ◽  
Hideaki Tsubaki ◽  
Shinichi Kanna
Keyword(s):  
Immersion Lithography ◽  
Lithography Process ◽  
Double Patterning ◽  
193 Nm

Behavior and effects of water penetration in 193-nm immersion lithography process materials

2007 ◽  
Author(s):  
Takafumi Niwa ◽  
Steven Scheer ◽  
Mike Carcasi ◽  
Masashi Enomoto ◽  
Tadatoshi Tomita ◽  
...  
Keyword(s):  
Water Penetration ◽  
Immersion Lithography ◽  
Lithography Process ◽  
193 Nm

scholarly journals Novel high-index resists for 193-nm immersion lithography and beyond

2007 ◽  
Author(s):  
Idriss Blakey ◽  
Lan Chen ◽  
Bronwin Dargaville ◽  
Heping Liu ◽  
Andrew Whittaker ◽  
...  
Keyword(s):  
High Index ◽  
Immersion Lithography ◽  
193 Nm

XLR 600i: recirculating ring ArF light source for double patterning immersion lithography

2008 ◽  
Author(s):  
Vladimir Fleurov ◽  
Slava Rokitski ◽  
Robert Bergstedt ◽  
Hong Ye ◽  
Kevin O’Brien ◽  
...  
Keyword(s):  
Light Source ◽  
Immersion Lithography ◽  
Double Patterning

6 kHz MOPA light source for 193 nm immersion lithography

2005 ◽  
Author(s):  
Walter D. Gillespie ◽  
Toshihiko Ishihara ◽  
William N. Partlo ◽  
George X. Ferguson ◽  
Michael R. Simon
Keyword(s):  
Light Source ◽  
Immersion Lithography ◽  
193 Nm

Implications of immersion lithography on 193-nm photoresists

2004 ◽  
Author(s):  
J. Christopher Taylor ◽  
Charles R. Chambers ◽  
Ryan Deschner ◽  
Robert J. LeSuer ◽  
Willard E. Conley ◽  
...  
Keyword(s):  
Immersion Lithography ◽  
193 Nm

Self-aligned double patterning process for 32/32nm contact/space and beyond using 193 immersion lithography

2010 ◽  
Author(s):  
Bencherki Mebarki ◽  
Liyan Miao ◽  
Yongmei Chen ◽  
James Yu ◽  
Pokhui Blanco ◽  
...  
Keyword(s):  
Immersion Lithography ◽  
Double Patterning ◽  
Contact Space

Flexible and reliable high power injection locked laser for double exposure and double patterning ArF immersion lithography

2010 ◽  
Author(s):  
Masaya Yoshino ◽  
Hiroshi Umeda ◽  
Hiroaki Tsushima ◽  
Hidenori Watanabe ◽  
Satoshi Tanaka ◽  
...  
Keyword(s):  
High Power ◽  
Double Exposure ◽  
Immersion Lithography ◽  
Power Injection ◽  
Double Patterning

Ecology and high-durability injection locked laser with flexible power for double-patterning ArF immersion lithography

2011 ◽  
Author(s):  
Hiroshi Umeda ◽  
Hiroaki Tsushima ◽  
Hidenori Watanabe ◽  
Satoshi Tanaka ◽  
Masaya Yoshino ◽  
...  
Keyword(s):  
Immersion Lithography ◽  
High Durability ◽  
Double Patterning
Sign in / Sign up

Export Citation Format

Share Document