Optical Microlithography XXXI
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9781510616660, 9781510616677
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Roughness power spectral density as a function of resist parameters and its impact through process

2018 ◽  
Author(s):  
Charlotte Cutler ◽  
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Choong-Bong Lee ◽  
Mingqi Li ◽  
...  
Keyword(s):  
Spectral Density ◽  
Power Spectral Density ◽  
Power Spectral

DUV light source sustainability achievements and next steps

2018 ◽  
Author(s):  
Yzzer Roman ◽  
Theodore Cacouris ◽  
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Siqi Luo ◽  
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Next-generation ArF Laser technologies for multiple-patterning immersion lithography supporting leading edge processes

2018 ◽  
Author(s):  
Hirotaka Miyamoto ◽  
Hiroshi Furusato ◽  
Keisuke Ishida ◽  
Hiroaki Tsushima ◽  
Akihiko Kurosu ◽  
...  
Keyword(s):  
Leading Edge ◽  
Next Generation ◽  
Immersion Lithography ◽  
Laser Technologies ◽  
Arf Laser

Tunable bandwidth for application-specific SAxP process enhancement

2018 ◽  
Author(s):  
Paolo Alagna ◽  
Serge Biesemans ◽  
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Gian Francesco Lorusso ◽  
Gregory Rechtsteiner ◽  
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Application Specific

Advanced light source technologies for memory and logic processes (Conference Presentation)

2018 ◽  
Author(s):  
Theodore Cacouris ◽  
Josh Thornes ◽  
Marc Sells ◽  
Aleks Simic ◽  
Will Conley
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Light Source ◽  
Advanced Light Source

Improving 130nm node patterning using inverse lithography techniques for an analog process

2018 ◽  
Author(s):  
Can Duan ◽  
Scott Jessen ◽  
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Steve Prins ◽  
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Freeform mask optimization using advanced image based M3D inverse lithography and 3D-NAND full chip opc application

2018 ◽  
Author(s):  
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Jun He ◽  
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Cross-platform (NXE-NXT) machine-to-machine overlay matching supporting next node chip manufacturing

2018 ◽  
Author(s):  
Ting-Ju Yueh ◽  
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Shin-Rung Peng ◽  
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Keyword(s):  
Machine To Machine ◽  
Cross Platform
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