The ArF laser for the next generation multiple-patterning immersion lithography supporting green operations and leading edge processes

2017 ◽  
Author(s):  
Hirotaka Miyamoto ◽  
Takahito Kumazaki ◽  
Hiroaki Tsushima ◽  
Akihiko Kurosu ◽  
Takeshi Ohta ◽  
...  
Keyword(s):  
Leading Edge ◽  
Next Generation ◽  
Immersion Lithography ◽  
Arf Laser

Next-generation ArF Laser technologies for multiple-patterning immersion lithography supporting leading edge processes

2018 ◽  
Author(s):  
Hirotaka Miyamoto ◽  
Hiroshi Furusato ◽  
Keisuke Ishida ◽  
Hiroaki Tsushima ◽  
Akihiko Kurosu ◽  
...  
Keyword(s):  
Leading Edge ◽  
Next Generation ◽  
Immersion Lithography ◽  
Laser Technologies ◽  
Arf Laser

The ArF laser for the next-generation multiple-patterning immersion lithography supporting green operations

2016 ◽  
Author(s):  
Keisuke Ishida ◽  
Takeshi Ohta ◽  
Hirotaka Miyamoto ◽  
Takahito Kumazaki ◽  
Hiroaki Tsushima ◽  
...  
Keyword(s):  
Next Generation ◽  
Immersion Lithography ◽  
Arf Laser

120W ArF laser with high-wavelength stability and efficiency for the next-generation multiple-patterning immersion lithography

2015 ◽  
Author(s):  
Takeshi Ohta ◽  
Keisuke Ishida ◽  
Takahito Kumazaki ◽  
Hiroaki Tsushima ◽  
Akihiko Kurosu ◽  
...  
Keyword(s):  
Next Generation ◽  
Immersion Lithography ◽  
Arf Laser ◽  
High Wavelength

scholarly journals High Refractive Index Fluid for Next Generation ArF Immersion Lithography

2006 ◽  
Vol 19 (5) ◽  
pp. 641-646 ◽  
Author(s):  
Taiichi Furukawa ◽  
Katsuhiko Hieda ◽  
Yong Wang ◽  
Takashi Miyamatsu ◽  
Kinji Yamada ◽  
...  
Keyword(s):  
Refractive Index ◽  
High Refractive Index ◽  
Next Generation ◽  
Immersion Lithography

High refractive index materials design for the next generation ArF immersion lithography

2008 ◽  
Author(s):  
Taiichi Furukawa ◽  
Takanori Kishida ◽  
Kyouyuu Yasuda ◽  
Tsutomu Shimokawa ◽  
Zhi Liu ◽  
...  
Keyword(s):  
Refractive Index ◽  
Materials Design ◽  
High Refractive Index ◽  
Next Generation ◽  
Immersion Lithography

scholarly journals Demonstration of ACO-Based Freeform Source for ArF Laser Immersion Lithography System

IEEE Access ◽  
2017 ◽  
pp. 1-1 ◽  
Author(s):  
Frederick Lie ◽  
Chao-Yi Huang ◽  
Chun-Sheng Wu ◽  
Kao-Tun Chen ◽  
Hung-Fei Kuo
Keyword(s):  
Immersion Lithography ◽  
Arf Laser ◽  
Lithography System

A reliable higher power ArF laser with advanced functionality for immersion lithography

2012 ◽  
Author(s):  
Akihiko Kurosu ◽  
Masaki Nakano ◽  
Masanori Yashiro ◽  
Masaya Yoshino ◽  
Hiroaki Tsushima ◽  
...  
Keyword(s):  
Immersion Lithography ◽  
Higher Power ◽  
Arf Laser

scholarly journals GO_3D_OBS – The Nankai Trough-inspired benchmark geomodel for seismic imaging methods assessment and next generation 3D surveys design (version 1.0)

2020 ◽  
Author(s):  
Andrzej Górszczyk ◽  
Stéphane Operto
Keyword(s):  
High Resolution ◽  
Large Scale ◽  
Nankai Trough ◽  
Regional Scale ◽  
Waveform Inversion ◽  
Leading Edge ◽  
High Resolution Imaging ◽  
Ocean Bottom ◽  
Next Generation ◽  
Resolution Imaging

Abstract. Detailed reconstruction of deep crustal targets by seismic methods remains a long-standing challenge. One key to address this challenge is the joint development of new seismic acquisition systems and leading-edge processing techniques. In marine environments, controlled-source seismic surveys at regional scale are typically carried out with sparse arrays of ocean bottom seismometers (OBSs), which provide incomplete and down-sampled subsurface illumination. To assess and minimize the acquisition footprint in high-resolution imaging process such as full waveform inversion, realistic crustal-scale benchmark models are clearly required.The deficiency of such models prompts us to build one and release it freely to the geophysical community. Here we introduce GO_3D_OBS – a 3D high-resolution geomodel representing a subduction zone, inspired by the geology of the Nankai Trough. The 175 km x 100 km x 30 km model integrates complex geological structures with a visco-elastic isotropic parametrization. It is defined in form of a uniform Cartesian grid containing 33.6e9 degrees of freedom for a grid interval of 25 m. The size of the model raises significant high-performance computing challenges to tackle large-scale forward propagation simulations and related inverse problems. We describe the workflow designed to implement all the model ingredients including 2D structural segments, their projection into the third dimension, stochastic components and physical parametrisation. Various wavefield simulations we present clearly reflect in the seismograms the structural complexity of the model and the footprint of different physical approximations. This benchmark model shall help to optimize the design of next generation 3D academic surveys – in particular but not only long-offset OBS experiments – to mitigate the acquisition footprint during high-resolution imaging of the deep crust.

ArF lightsource “GT66A” for next-generation immersion lithography enhancing EPE and CD performance

2021 ◽  
Author(s):  
Toshihiro Oga ◽  
Shinichi Matsumoto ◽  
Taku Yamazaki ◽  
Takeshi Ohta ◽  
Satoru Bushida
Keyword(s):  
Next Generation ◽  
Immersion Lithography
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