scholarly journals Demonstration of ACO-Based Freeform Source for ArF Laser Immersion Lithography System

IEEE Access ◽  
2017 ◽  
pp. 1-1 ◽  
Author(s):  
Frederick Lie ◽  
Chao-Yi Huang ◽  
Chun-Sheng Wu ◽  
Kao-Tun Chen ◽  
Hung-Fei Kuo
Keyword(s):  
Immersion Lithography ◽  
Arf Laser ◽  
Lithography System

Next-generation ArF Laser technologies for multiple-patterning immersion lithography supporting leading edge processes

2018 ◽  
Author(s):  
Hirotaka Miyamoto ◽  
Hiroshi Furusato ◽  
Keisuke Ishida ◽  
Hiroaki Tsushima ◽  
Akihiko Kurosu ◽  
...  
Keyword(s):  
Leading Edge ◽  
Next Generation ◽  
Immersion Lithography ◽  
Laser Technologies ◽  
Arf Laser

A reliable higher power ArF laser with advanced functionality for immersion lithography

2012 ◽  
Author(s):  
Akihiko Kurosu ◽  
Masaki Nakano ◽  
Masanori Yashiro ◽  
Masaya Yoshino ◽  
Hiroaki Tsushima ◽  
...  
Keyword(s):  
Immersion Lithography ◽  
Higher Power ◽  
Arf Laser

scholarly journals Vectorial pupil optimization to compensate polarization distortion in immersion lithography system

2020 ◽  
Vol 28 (4) ◽  
pp. 4412
Author(s):  
Tie Li ◽  
Yang Liu ◽  
Yiyu Sun ◽  
Xu Yan ◽  
Pengzhi Wei ◽  
...  
Keyword(s):  
Immersion Lithography ◽  
Lithography System

The ArF laser for the next-generation multiple-patterning immersion lithography supporting green operations

2016 ◽  
Author(s):  
Keisuke Ishida ◽  
Takeshi Ohta ◽  
Hirotaka Miyamoto ◽  
Takahito Kumazaki ◽  
Hiroaki Tsushima ◽  
...  
Keyword(s):  
Next Generation ◽  
Immersion Lithography ◽  
Arf Laser

Performance of a 1.35NA ArF immersion lithography system for 40-nm applications

2007 ◽  
Author(s):  
Jos de Klerk ◽  
Christian Wagner ◽  
Richard Droste ◽  
Leon Levasier ◽  
Louis Jorritsma ◽  
...  
Keyword(s):  
Immersion Lithography ◽  
Lithography System

120W ArF laser with high-wavelength stability and efficiency for the next-generation multiple-patterning immersion lithography

2015 ◽  
Author(s):  
Takeshi Ohta ◽  
Keisuke Ishida ◽  
Takahito Kumazaki ◽  
Hiroaki Tsushima ◽  
Akihiko Kurosu ◽  
...  
Keyword(s):  
Next Generation ◽  
Immersion Lithography ◽  
Arf Laser ◽  
High Wavelength

The ArF laser for the next generation multiple-patterning immersion lithography supporting green operations and leading edge processes

2017 ◽  
Author(s):  
Hirotaka Miyamoto ◽  
Takahito Kumazaki ◽  
Hiroaki Tsushima ◽  
Akihiko Kurosu ◽  
Takeshi Ohta ◽  
...  
Keyword(s):  
Leading Edge ◽  
Next Generation ◽  
Immersion Lithography ◽  
Arf Laser
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