ArF lightsource “GT66A” for next-generation immersion lithography enhancing EPE and CD performance

2021 ◽  
Author(s):  
Toshihiro Oga ◽  
Shinichi Matsumoto ◽  
Taku Yamazaki ◽  
Takeshi Ohta ◽  
Satoru Bushida
Keyword(s):  
Next Generation ◽  
Immersion Lithography

scholarly journals High Refractive Index Fluid for Next Generation ArF Immersion Lithography

2006 ◽  
Vol 19 (5) ◽  
pp. 641-646 ◽  
Author(s):  
Taiichi Furukawa ◽  
Katsuhiko Hieda ◽  
Yong Wang ◽  
Takashi Miyamatsu ◽  
Kinji Yamada ◽  
...  
Keyword(s):  
Refractive Index ◽  
High Refractive Index ◽  
Next Generation ◽  
Immersion Lithography

Next-generation ArF Laser technologies for multiple-patterning immersion lithography supporting leading edge processes

2018 ◽  
Author(s):  
Hirotaka Miyamoto ◽  
Hiroshi Furusato ◽  
Keisuke Ishida ◽  
Hiroaki Tsushima ◽  
Akihiko Kurosu ◽  
...  
Keyword(s):  
Leading Edge ◽  
Next Generation ◽  
Immersion Lithography ◽  
Laser Technologies ◽  
Arf Laser

High refractive index materials design for the next generation ArF immersion lithography

2008 ◽  
Author(s):  
Taiichi Furukawa ◽  
Takanori Kishida ◽  
Kyouyuu Yasuda ◽  
Tsutomu Shimokawa ◽  
Zhi Liu ◽  
...  
Keyword(s):  
Refractive Index ◽  
Materials Design ◽  
High Refractive Index ◽  
Next Generation ◽  
Immersion Lithography

The ArF laser for the next-generation multiple-patterning immersion lithography supporting green operations

2016 ◽  
Author(s):  
Keisuke Ishida ◽  
Takeshi Ohta ◽  
Hirotaka Miyamoto ◽  
Takahito Kumazaki ◽  
Hiroaki Tsushima ◽  
...  
Keyword(s):  
Next Generation ◽  
Immersion Lithography ◽  
Arf Laser

High-refractive-index fluids for the next-generation ArF immersion lithography

2006 ◽  
Author(s):  
Yong Wang ◽  
Takashi Miyamatsu ◽  
Taiichi Furukawa ◽  
Kinji Yamada ◽  
Tetsuo Tominaga ◽  
...  
Keyword(s):  
Refractive Index ◽  
High Refractive Index ◽  
Next Generation ◽  
Immersion Lithography

120W ArF laser with high-wavelength stability and efficiency for the next-generation multiple-patterning immersion lithography

2015 ◽  
Author(s):  
Takeshi Ohta ◽  
Keisuke Ishida ◽  
Takahito Kumazaki ◽  
Hiroaki Tsushima ◽  
Akihiko Kurosu ◽  
...  
Keyword(s):  
Next Generation ◽  
Immersion Lithography ◽  
Arf Laser ◽  
High Wavelength

Development of the next-generation ArF excimer laser with ultra-narrow stable spectral bandwidth for multiple patterning immersion lithography

2017 ◽  
Author(s):  
Hiroshi Furusato ◽  
Takahito Kumazaki ◽  
Takeshi Ohta ◽  
Hiroaki Tsushima ◽  
Akihiko Kurosu ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Spectral Bandwidth ◽  
Next Generation ◽  
Immersion Lithography ◽  
Arf Excimer Laser

The ArF laser for the next generation multiple-patterning immersion lithography supporting green operations and leading edge processes

2017 ◽  
Author(s):  
Hirotaka Miyamoto ◽  
Takahito Kumazaki ◽  
Hiroaki Tsushima ◽  
Akihiko Kurosu ◽  
Takeshi Ohta ◽  
...  
Keyword(s):  
Leading Edge ◽  
Next Generation ◽  
Immersion Lithography ◽  
Arf Laser

scholarly journals Evaluation of Next Generation Fluids for ArF Immersion Lithography Beyond Water

2007 ◽  
Vol 20 (5) ◽  
pp. 729-738 ◽  
Author(s):  
Hoang Tran ◽  
Roger H. French ◽  
Douglas J. Adelman ◽  
Jerald Feldman ◽  
Weiming Qiu ◽  
...  
Keyword(s):  
Next Generation ◽  
Immersion Lithography
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