Adhesion between polycarbonate substrate and SiO2 film formed from silane and nitrous oxide by plasma‐enhanced chemical vapor deposition

1994 ◽  
Vol 12 (3) ◽  
pp. 746-750 ◽  
Author(s):  
Makoto Shinoda ◽  
Toshikazu Nishide ◽  
Yushi Shichi
Keyword(s):  
Nitrous Oxide ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Sio2 Film ◽  
Polycarbonate Substrate

SiO2 Film Coatings with VUV Excimer Lamp CVD

1998 ◽  
Vol 555 ◽  
Author(s):  
K. Kurosawa ◽  
N. Takezoe ◽  
H. Yanagida ◽  
R. Nomura ◽  
A. Yokotani
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Silica Film ◽  
Sio2 Film ◽  
Single Crystal Substrate ◽  
Excimer Lamp ◽  
Film Coatings ◽  
Crystal Substrate ◽  
Optical Applications

AbstractSilica film coatings were demonstrated using photo-chemical vapor deposition with a 172-nm Xe excimer lamp. Tetraethoxyorthosilicate (TEOS) molecules were successfully dissociated into SiO2+2C2H5-OH+;(residual C and H) with the 7.2-eV photons. The films were deposited onto a quartz or Al203 single crystal substrate with the deposition rate of 1 nm/min. The films were uniform and smooth enough for optical applications.

scholarly journals Interface Properties of the Two Step Oxide Layers by UV Light Excited Ozone Silicon Oxidation and Chemical Vapor Deposition (CVD)-SiO2 Film

2010 ◽  
Vol 53 (3) ◽  
pp. 230-233
Author(s):  
Naoto KAMEDA ◽  
Tetsuya NISHIGUCHI ◽  
Yoshiki MORIKAWA ◽  
Mitsuru KEKURA ◽  
Tomoharu USHIYAMA ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Uv Light ◽  
Chemical Vapor ◽  
Sio2 Film ◽  
Interface Properties ◽  
Silicon Oxidation ◽  
Oxide Layers
Sign in / Sign up

Export Citation Format

Share Document