Formation of High‐Quality Nitrided Silicon Dioxide Films Using Electron‐Cyclotron Resonance Chemical Vapor Deposition with Nitrous Oxide and Silane

1996 ◽  
Vol 143 (5) ◽  
pp. 1681-1684 ◽  
Author(s):  
D. Landheer ◽  
Y. Tao ◽  
J. E. Hulse ◽  
T. Quance ◽  
D. Xu
Keyword(s):  
Nitrous Oxide ◽  
Chemical Vapor Deposition ◽  
Silicon Dioxide ◽  
Vapor Deposition ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Chemical Vapor ◽  
Electron Cyclotron ◽  
High Quality ◽  
Silicon Dioxide Films

Room temperature electron cyclotron resonance chemical vapor deposition of high quality TiN

1995 ◽  
Vol 66 (3) ◽  
pp. 302-304 ◽  
Author(s):  
Mohamed Boumerzoug ◽  
Zhengda Pang ◽  
Marcel Boudreau ◽  
Peter Mascher ◽  
John G. Simmons
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Cyclotron Resonance ◽  
Room Temperature ◽  
Electron Cyclotron Resonance ◽  
Chemical Vapor ◽  
Electron Cyclotron ◽  
High Quality ◽  
Temperature Electron
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