scholarly journals Interface Properties of the Two Step Oxide Layers by UV Light Excited Ozone Silicon Oxidation and Chemical Vapor Deposition (CVD)-SiO2 Film

2010 ◽  
Vol 53 (3) ◽  
pp. 230-233
Author(s):  
Naoto KAMEDA ◽  
Tetsuya NISHIGUCHI ◽  
Yoshiki MORIKAWA ◽  
Mitsuru KEKURA ◽  
Tomoharu USHIYAMA ◽  
...  
2003 ◽  
Vol 32 (11) ◽  
pp. 1076-1077 ◽  
Author(s):  
Takurou N. Murakami ◽  
Yujiro Kijitori ◽  
Norimichi Kawashima ◽  
Tsutomu Miyasaka

2004 ◽  
Author(s):  
Alireza Yasan ◽  
Ryan McClintock ◽  
Kathryn A. Mayes ◽  
Derek J. Shiell ◽  
Shaban R. Darvish ◽  
...  

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