Non-Close-Packed Crystals from Self-Assembled Polystyrene Spheres by Isotropic Plasma Etching: Adding Flexibility to Colloid Lithography

2009 ◽  
Vol 19 (20) ◽  
pp. 3279-3284 ◽  
Author(s):  
Alfred Plettl ◽  
Fabian Enderle ◽  
Marc Saitner ◽  
Achim Manzke ◽  
Christian Pfahler ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Polystyrene Spheres ◽  
Isotropic Plasma ◽  
Self Assembled

scholarly journals Superhydrophilic Coating of Pine Wood by Plasma Functionalization of Self-Assembled Polystyrene Spheres

Coatings ◽  
2021 ◽  
Vol 11 (2) ◽  
pp. 114
Author(s):  
Sebastian Dahle ◽  
John Meuthen ◽  
René Gustus ◽  
Alexandra Prowald ◽  
Wolfgang Viöl ◽  
...  
Keyword(s):  
Dip Coating ◽  
Face Centered Cubic ◽  
Wood Substrate ◽  
Polystyrene Spheres ◽  
Pine Wood ◽  
Self Assembling ◽  
Monodisperse Polystyrene ◽  
Self Assembled ◽  
Face Centered ◽  
Plasma Functionalization

Self-assembling films typically used for colloidal lithography have been applied to pine wood substrates to change the surface wettability. Therefore, monodisperse polystyrene (PS) spheres have been deposited onto a rough pine wood substrate via dip coating. The resulting PS sphere film resembled a polycrystalline face centered cubic (FCC)-like structure with typical domain sizes of 5–15 single spheres. This self-assembled coating was further functionalized via an O2 plasma. This plasma treatment strongly influenced the particle sizes in the outermost layer, and hydroxyl as well as carbonyl groups were introduced to the PS spheres’ surfaces, thus generating a superhydrophilic behavior.

Silicon Patterning Using Self-assembled PS-b -PAA Diblock Copolymer Masks for Black Silicon Fabrication via Plasma Etching

2012 ◽  
Vol 9 (10) ◽  
pp. 968-974 ◽  
Author(s):  
Xin Zhang ◽  
Andrei B. Sushkov ◽  
Christopher J. Metting ◽  
Sean Fackler ◽  
H. Dennis Drew ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Diblock Copolymer ◽  
Black Silicon ◽  
Self Assembled

NANOTIPS COLD-END CONTACT FOR MICROCOOLING SYSTEMS

2005 ◽  
Vol 04 (04) ◽  
pp. 701-707
Author(s):  
KWONG-LUCK TAN ◽  
CIPRIAN ILIESCU ◽  
FRANCIS TAY ◽  
HUI-TONG CHUA ◽  
JIANMIN MIAO
Keyword(s):  
Plasma Etching ◽  
Fabrication Process ◽  
Isotropic Plasma

The paper presents the fabrication of nanotips cold-end contact for microcooling system. The fabrication process is based on an optimized isotropic plasma etching in SF 6/ O 2 using an ICP-deep RIE system from STS. We managed to fabricate the radius of the nanotips which are below 50 nm.

Poly(2-vinylnaphthalene)-block- poly(acrylic acid) Block Copolymer: Self-Assembled Pattern Formation, Alignment, and Transfer into Silicon via Plasma Etching

2011 ◽  
Vol 212 (16) ◽  
pp. 1735-1741 ◽  
Author(s):  
Xin Zhang ◽  
Christopher J. Metting ◽  
Robert M. Briber ◽  
Florian Weilnboeck ◽  
Sang Hak Shin ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Pattern Formation ◽  
Acrylic Acid ◽  
Plasma Etching ◽  
Self Assembled ◽  
Poly Acrylic Acid

A Strategy for Patterning Conducting Polymers Using Nanoimprint Lithography and Isotropic Plasma Etching

Small ◽  
2009 ◽  
Vol 5 (5) ◽  
pp. 583-586 ◽  
Author(s):  
Chunyu Huang ◽  
Bin Dong ◽  
Nan Lu ◽  
Bingjie Yang ◽  
Liguo Gao ◽  
...  
Keyword(s):  
Conducting Polymers ◽  
Plasma Etching ◽  
Nanoimprint Lithography ◽  
Isotropic Plasma

Isotropic plasma etching of doped and undoped silicon dioxide for contact holes and vias

1989 ◽  
Vol 7 (3) ◽  
pp. 670-675 ◽  
Author(s):  
W. G. M. van den Hoek ◽  
T. E. Wicker ◽  
B. F. Westlund ◽  
G. B. Powell
Keyword(s):  
Silicon Dioxide ◽  
Plasma Etching ◽  
Isotropic Plasma
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