ACS Symposium Series - Polymers for Microelectronics and Nanoelectronics
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Published By American Chemical Society

084123857x, 0841219796
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

157-nm Resist Materials Using Main-Chain Fluorinated Polymers

2004 ◽  
pp. 72-85
Author(s):  
Toshiro Itani ◽  
Hiroyuki Watanabe ◽  
Tamio Yamazaki ◽  
Seiichi Ishikawa ◽  
Naomi Shida ◽  
...  
Keyword(s):  
Main Chain ◽  
Fluorinated Polymers

Porous Low-k Dielectrics: Material Properties

2004 ◽  
pp. 161-172 ◽  
Author(s):  
C. Tyberg ◽  
E. Huang ◽  
J. Hedrick ◽  
E. Simonyi ◽  
S. Gates ◽  
...  
Keyword(s):  
Material Properties ◽  
Low K

Photolabile Ultrathin Polymer Films for Spatially Defined Attachment of Nano Elements

2004 ◽  
pp. 118-128 ◽  
Author(s):  
B. Voit ◽  
F. Braun ◽  
Ch. Loppacher ◽  
S. Trogisch ◽  
L. M. Eng ◽  
...  
Keyword(s):  
Polymer Films ◽  
Ultrathin Polymer Films

Design of Nanoporous Polyarylene Polymers for Use as Low-k Dielectrics in Microelectronic Devices

2004 ◽  
pp. 187-198 ◽  
Author(s):  
H. Craig Silvis ◽  
Kevin J. Bouck ◽  
James P. Godschalx ◽  
Q. Jason Niu ◽  
Michael J. Radler ◽  
...  
Keyword(s):  
Microelectronic Devices ◽  
Low K

scholarly journals Preface

2004 ◽  
pp. xi-xiii ◽  
Author(s):  
Qinghuang Lin ◽  
Raymond A. Pearson ◽  
Jeffrey C. Hedrick

Fluorocarbon Polymer-Based Photoresists for 157-nm Lithography

2004 ◽  
pp. 54-71 ◽  
Author(s):  
T. H. Fedynyshyn ◽  
W. A. Mowers ◽  
R. R. Kunz ◽  
R. F. Sinta ◽  
M. Sworin ◽  
...  
Keyword(s):  
Fluorocarbon Polymer
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