Soft Lithography on Block Copolymer Films: Generating Functionalized Patterns on Block Copolymer Films as a Basis to Further Surface Modification

2004 ◽  
pp. 129-143 ◽  
Author(s):  
Martin Brehmer ◽  
Lars Conrad ◽  
Lutz Funk ◽  
Dirk Allard ◽  
Patrick Théato ◽  
...  
Keyword(s):  
Surface Modification ◽  
Block Copolymer ◽  
Soft Lithography ◽  
Copolymer Films

scholarly journals High‐Fidelity, Sub‐5 nm Patterns from High‐χ Block Copolymer Films with Vapor‐Deposited Ultrathin, Cross‐Linked Surface‐Modification Layers

2020 ◽  
Vol 41 (4) ◽  
pp. 2070008
Author(s):  
Hyun Suk Wang ◽  
Seula Oh ◽  
Junhwan Choi ◽  
Wontae Jang ◽  
Ki Hyun Kim ◽  
...  
Keyword(s):  
Surface Modification ◽  
Block Copolymer ◽  
High Fidelity ◽  
Copolymer Films

High‐Fidelity, Sub‐5 nm Patterns from High‐χ Block Copolymer Films with Vapor‐Deposited Ultrathin, Cross‐Linked Surface‐Modification Layers

2020 ◽  
Vol 41 (4) ◽  
pp. 1900514 ◽  
Author(s):  
Hyun Suk Wang ◽  
Seula Oh ◽  
Junhwan Choi ◽  
Wontae Jang ◽  
Ki Hyun Kim ◽  
...  
Keyword(s):  
Surface Modification ◽  
Block Copolymer ◽  
High Fidelity ◽  
Copolymer Films

Surface modification of polyhedral oligomeric silsesquioxane block copolymer films by 157 nm laser light

2009 ◽  
Vol 105 (11) ◽  
pp. 114305 ◽  
Author(s):  
Evangelia Sarantopoulou ◽  
Zoe Kollia ◽  
Alkiviadis Constantinos Cefalas ◽  
Ageliki Elina Siokou ◽  
Panagiotis Argitis ◽  
...  
Keyword(s):  
Surface Modification ◽  
Block Copolymer ◽  
Laser Light ◽  
Polyhedral Oligomeric Silsesquioxane ◽  
Copolymer Films ◽  
Oligomeric Silsesquioxane

scholarly journals Ultra-Fast Vertical Ordering of Lamellar Block Copolymer Films on Unmodified Substrates

2021 ◽  
Vol 54 (3) ◽  
pp. 1564-1573
Author(s):  
Maninderjeet Singh ◽  
Wenjie Wu ◽  
Monali N. Basutkar ◽  
Joseph Strzalka ◽  
Abdullah M. Al-Enizi ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Copolymer Films

Morphology Control in Block Copolymer Films Using Mixed Solvent Vapors

ACS Nano ◽  
2012 ◽  
Vol 6 (9) ◽  
pp. 8052-8059 ◽  
Author(s):  
Kevin W. Gotrik ◽  
Adam F. Hannon ◽  
Jeong Gon Son ◽  
Brent Keller ◽  
Alfredo Alexander-Katz ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Mixed Solvent ◽  
Morphology Control ◽  
Copolymer Films ◽  
Solvent Vapors

Symmetry-breaking in double gyroid block copolymer films by non-affine distortion

2021 ◽  
Vol 23 ◽  
pp. 101006
Author(s):  
Seungyun Jo ◽  
Haedong Park ◽  
Taesuk Jun ◽  
Kwangjin Kim ◽  
Hyunsoo Jung ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Symmetry Breaking ◽  
Copolymer Films ◽  
Double Gyroid

Morphological Investigations of Organic/Inorganic Nanocomposites Fabricated to Achieve Controlled Dispersion at High Loadings

2011 ◽  
Vol 1312 ◽  
Author(s):  
Andrew J. Duncan ◽  
Andrew B. Schoch ◽  
Christopher S. Gold ◽  
Joseph L. Lenhart ◽  
Frederick L. Beyer
Keyword(s):  
Surface Modification ◽  
Block Copolymer ◽  
Hierarchical Structure ◽  
Sio2 Nanoparticles ◽  
Nanocomposite Materials ◽  
Aggregation State ◽  
Twin Screw ◽  
Inorganic Nanocomposites ◽  
Morphological Investigations

ABSTRACTRealization of property enhancements inherent to the presence of nanoparticles continues to be a challenge for the production of bulk nanocomposite materials with commercially available techniques. This study combines twin-screw compounding with surface modification of SiO2 nanoparticles to enable targeted dispersion in a SEBS block copolymer. Production of these composites with high levels of well-dispersed particulates aims to leverage aggregation for production of hierarchical structure. The aggregation state of the particles as well as the level of order in the block copolymer morphology was determined through USAXS and TEM. Particles coated with ligands miscible with the end-blocks of the BCP (minority component) increased dispersion at all loading levels observed up to 10 vol%. Ligands employed to increase miscibility of the nanoparticle with the mid-block (majority component) resulted in large aggregates for all loadings without disturbance of the BCP morphology.

Rapid shear alignment of sub-10 nm cylinder-forming block copolymer films based on thermal expansion mismatch

Nano Futures ◽  
2018 ◽  
Vol 1 (3) ◽  
pp. 035006
Author(s):  
Samuel M Nicaise ◽  
Karim R Gadelrab ◽  
Amir Tavakkoli K G ◽  
Caroline A Ross ◽  
Alfredo Alexander-Katz ◽  
...  
Keyword(s):  
Thermal Expansion ◽  
Block Copolymer ◽  
Thermal Expansion Mismatch ◽  
Shear Alignment ◽  
Copolymer Films
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