Fluorocarbon Polymer-Based Photoresists for 157-nm Lithography
Keyword(s):
Keyword(s):
1998 ◽
Vol 29
(8)
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pp. 455-461
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2006 ◽
Vol 103
(1)
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pp. 100-109
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1996 ◽
Vol 96-98
◽
pp. 586-590
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