A 4H-SiC Bipolar Technology for High-temperature Integrated Circuits
A 4H-SiC bipolar technology suitable for high-temperature integrated circuits is tested with two interconnect systems based on Aluminium and Platinum. Successful operation of low-voltage bipolar transistor and digital integrated circuits based on emitter coupled logic (ECL) is reported from 27 up to 500 °C for both the metallization systems. When operated on −15 V supply voltage, Aluminium and Platinum OR-NOR gates showed stable noise margins of about 1 V and asymmetric propagation delays of about 200 and 700 ns in the whole temperature range for both OR and NOR output. The performance of Aluminium and Platinum interconnect were evaluated by performing accelerated electromigration tests at 300 °C with current density of about 1 MA/cm2 on contact chains consisting of 10 integrated resistors.