Optical Microlithography XVIII
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178
(FIVE YEARS 0)

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Published By SPIE

9780819457349
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

The problem of optimal placement of sub-resolution assist features (SRAF)

2005 ◽  
Author(s):  
Maharaj Mukherjee ◽  
Scott Mansfield ◽  
Lars Liebmann ◽  
Alexey Lvov ◽  
Evanthia Papadapoulou ◽  
...  
Keyword(s):  
Optimal Placement

6 kHz MOPA light source for 193 nm immersion lithography

2005 ◽  
Author(s):  
Walter D. Gillespie ◽  
Toshihiko Ishihara ◽  
William N. Partlo ◽  
George X. Ferguson ◽  
Michael R. Simon
Keyword(s):  
Light Source ◽  
Immersion Lithography ◽  
193 Nm

Proximity matching for 193 nm scanner using scatterometry

2005 ◽  
Author(s):  
WenZhan Zhou ◽  
Jin Yu ◽  
James Lo ◽  
Johnson Liu ◽  
Henry Tjhin ◽  
...  
Keyword(s):  
193 Nm

scholarly journals Mask induced polarization effects at high NA

2005 ◽  
Author(s):  
Andrew Estroff ◽  
Yongfa Fan ◽  
Anatoly Bourov ◽  
Bruce Smith ◽  
Philippe Foubert ◽  
...  
Keyword(s):  
Induced Polarization ◽  
Polarization Effects

Laser-induced birefringence in fused silica from polarized lasers

2005 ◽  
Author(s):  
Ulrich Neukirch ◽  
Douglas C. Allan ◽  
Nicholas F. Borrelli ◽  
Christine E. Heckle ◽  
Michal Mlejnek ◽  
...  
Keyword(s):  
Fused Silica

Alignment robustness for 90 nm and 65 nm node through copper alignment mark integration optimization

2005 ◽  
Author(s):  
Scott Warrick ◽  
Paul Hinnen ◽  
Rob Morton ◽  
Kevin Cooper ◽  
Pierre-Olivier Sassoulas ◽  
...  
Keyword(s):  
Alignment Mark
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