Self-aligned double patterning process for 32/32nm contact/space and beyond using 193 immersion lithography

2010 ◽  
Author(s):  
Bencherki Mebarki ◽  
Liyan Miao ◽  
Yongmei Chen ◽  
James Yu ◽  
Pokhui Blanco ◽  
...  
Keyword(s):  
Immersion Lithography ◽  
Double Patterning ◽  
Contact Space

XLR 600i: recirculating ring ArF light source for double patterning immersion lithography

2008 ◽  
Author(s):  
Vladimir Fleurov ◽  
Slava Rokitski ◽  
Robert Bergstedt ◽  
Hong Ye ◽  
Kevin O’Brien ◽  
...  
Keyword(s):  
Light Source ◽  
Immersion Lithography ◽  
Double Patterning

Flexible and reliable high power injection locked laser for double exposure and double patterning ArF immersion lithography

2010 ◽  
Author(s):  
Masaya Yoshino ◽  
Hiroshi Umeda ◽  
Hiroaki Tsushima ◽  
Hidenori Watanabe ◽  
Satoshi Tanaka ◽  
...  
Keyword(s):  
High Power ◽  
Double Exposure ◽  
Immersion Lithography ◽  
Power Injection ◽  
Double Patterning

Ecology and high-durability injection locked laser with flexible power for double-patterning ArF immersion lithography

2011 ◽  
Author(s):  
Hiroshi Umeda ◽  
Hiroaki Tsushima ◽  
Hidenori Watanabe ◽  
Satoshi Tanaka ◽  
Masaya Yoshino ◽  
...  
Keyword(s):  
Immersion Lithography ◽  
High Durability ◽  
Double Patterning

Reflection control for immersion lithography: a single organic antireflectant over high-reflective substrates for double patterning

2009 ◽  
Author(s):  
Sabrina Wong ◽  
Jeong Yun Yu ◽  
Sue Ryeon Kim ◽  
Mike Mori ◽  
Amy Kwok ◽  
...  
Keyword(s):  
Immersion Lithography ◽  
Double Patterning

Immersion lithography and double patterning in advanced microelectronics

2009 ◽  
Author(s):  
T. Vandeweyer ◽  
J. Bekaert ◽  
M. Ercken ◽  
R. Gronheid ◽  
A. Miller ◽  
...  
Keyword(s):  
Immersion Lithography ◽  
Double Patterning

Flexible 60-90W ArF light source for double patterning immersion lithography in high volume manufacturing

2009 ◽  
Author(s):  
Slava Rokitski ◽  
Toshi Ishihara ◽  
Rajeskar Rao ◽  
Rui Jiang ◽  
Daniel Riggs ◽  
...  
Keyword(s):  
Light Source ◽  
High Volume ◽  
Immersion Lithography ◽  
Double Patterning

Effect of Injection Parameters on Immersion Liquid during Wafer Scanning

2012 ◽  
Vol 591-593 ◽  
pp. 351-355
Author(s):  
Hui Chen ◽  
Qi Liu
Keyword(s):  
Three Dimensional ◽  
Lens Distortion ◽  
Dynamics Model ◽  
Immersion Liquid ◽  
Scanning Velocity ◽  
Computational Fluid Dynamics Model ◽  
Immersion Lithography ◽  
Injection Parameters ◽  
New Challenges ◽  
Double Patterning

Double patterning improves the development of immersion lithography, but it brings new challenges including the higher scanning velocity of wafer. In this paper, considering two typical injection types, the three-dimensional computational fluid dynamics model is developed to investigate the effect of injection parameters on immersion liquid during wafer scanning. By analyzing the velocity distribution of immersion flow and normal stress on the lens, the proper parameters of injection are proposed under the typical conditions, and the appropriate parameters which lead to effective renovation with low lens distortion are also given.

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