Flexible and reliable high power injection locked laser for double exposure and double patterning ArF immersion lithography

2010 ◽  
Author(s):  
Masaya Yoshino ◽  
Hiroshi Umeda ◽  
Hiroaki Tsushima ◽  
Hidenori Watanabe ◽  
Satoshi Tanaka ◽  
...  
Keyword(s):  
High Power ◽  
Double Exposure ◽  
Immersion Lithography ◽  
Power Injection ◽  
Double Patterning

Reliable high power injection locked 6 kHz 60W laser for ArF immersion lithography

2008 ◽  
Author(s):  
Takahito Kumazaki ◽  
Toru Suzuki ◽  
Satoshi Tanaka ◽  
Ryoichi Nohdomi ◽  
Masaya Yoshino ◽  
...  
Keyword(s):  
High Power ◽  
Immersion Lithography ◽  
Power Injection

Reliable high-power injection locked 6kHz 60W laser for ArF immersion lithography

2007 ◽  
Author(s):  
Hidenori Watanabe ◽  
Shigeo Komae ◽  
Satoshi Tanaka ◽  
Ryoichi Nohdomi ◽  
Taku Yamazaki ◽  
...  
Keyword(s):  
High Power ◽  
Immersion Lithography ◽  
Power Injection

XLR 600i: recirculating ring ArF light source for double patterning immersion lithography

2008 ◽  
Author(s):  
Vladimir Fleurov ◽  
Slava Rokitski ◽  
Robert Bergstedt ◽  
Hong Ye ◽  
Kevin O’Brien ◽  
...  
Keyword(s):  
Light Source ◽  
Immersion Lithography ◽  
Double Patterning

Double Patterning Analysis Method by Emulation Using a Double-Exposure Technique

2010 ◽  
Vol 49 (3) ◽  
pp. 035201
Author(s):  
Junji Miyazaki ◽  
Nobuhito Toyama ◽  
Akira Kawai
Keyword(s):  
Analysis Method ◽  
Double Exposure ◽  
Double Patterning ◽  
Exposure Technique

Self-aligned double patterning process for 32/32nm contact/space and beyond using 193 immersion lithography

2010 ◽  
Author(s):  
Bencherki Mebarki ◽  
Liyan Miao ◽  
Yongmei Chen ◽  
James Yu ◽  
Pokhui Blanco ◽  
...  
Keyword(s):  
Immersion Lithography ◽  
Double Patterning ◽  
Contact Space
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