Verification of compaction and rarefaction models for fused silica with 40 billion pulses of 193-nm excimer laser exposure and their effects on projection lens imaging performance

2004 ◽  
Author(s):  
J. Martin Algots ◽  
Richard Sandstrom ◽  
William Partlo ◽  
Kazuhiro Takahashi ◽  
Hiroyuki Ishii ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Fused Silica ◽  
Laser Exposure ◽  
Projection Lens ◽  
193 Nm ◽  
Imaging Performance

Compaction and rarefaction of fused silica with 193-nm excimer laser exposure

2003 ◽  
Author(s):  
J. Martin Algots ◽  
Richard Sandstrom ◽  
William N. Partlo ◽  
Petar Maroevic ◽  
Eric Eva ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Fused Silica ◽  
Laser Exposure ◽  
193 Nm

Recent Progress in Excimer Laser Lithography

1987 ◽  
Vol 101 ◽  
Author(s):  
I. Higashikawa ◽  
M. Nonaka ◽  
T. Sato ◽  
M. Nakase ◽  
S. Ito ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Diffraction Method ◽  
Pulse Frequency ◽  
Field Size ◽  
Laser Exposure ◽  
Projection Lens ◽  
Laser Lithography ◽  
Alignment System ◽  
Space Pattern ◽  
Krf Excimer Laser

ABSTRACTA KrF excimer laser exposure method has been developed for laboratory use, which employs 10 to 1 achromatic projection lens of 0.37 NA and 5x5 mm field size , and a TTL alignment system using the double diffraction method, which was realized by the use,of the achromatic lens. Novolak type mid-UV resists, such as AZ-5214 and PR-1024, were best suited for use in 248 nm exposure, considering the sensitivity and etching resistance from a practical viewpoint, and an additional post exposure baking process also improved the resist profile. The dependences of the exposure characteristics on the energy density per pulse and pulse frequency of these resists were not observed in the region of the practical exposure conditions. An alignment precision of x±30-= 0.2 μm was achieved for the alignment mark consisting of poly Si pattern. Thus, a 0.3 μm line and space pattern was realized by using tri-level resist process and a 0.2 μm gate pattern was successfully fabricated on the coplanar pattern with a 0.4 μm step.

Production of Electronically Excited P2 and in from ArF Excimer Laser Irradiation of InP

1986 ◽  
Vol 75 ◽  
Author(s):  
V. M. Donnelly ◽  
V. R. McCrary ◽  
D. Brasen
Keyword(s):  
Excimer Laser ◽  
Laser Frequency ◽  
Laser Exposure ◽  
Resonance Fluorescence ◽  
Thermally Activated ◽  
Ejection Process ◽  
Electronically Excited ◽  
Excimer Laser Irradiation ◽  
Arf Excimer Laser ◽  
193 Nm

AbstractWe have investigated the decomposition of single-crystal InP surfaces irradiated by a 193 nm ArF excimer laser. These studies provide insight into mechanisms of thermal decomposition, surface diffusion and epitaxy. Pulsed laser exposure leads to evolution of P2 from the surface which is detected by resonance fluorescence resulting from a fortuitous overlap of the v″ = 0 with the laser frequency. P2-evolution occurs above a threshold fluence of 0.12 J/cm2 and lags the peak laser intensity by ∼20 nsec. These observations are explained by a thermally activated decomposition mechanism, as opposed to any direct, photochemical ejection process. Peak surface temperatures have been calculated and are used to predict P2 yields as a function of fluence and time which are in good agreement with experiments. These findings are also discussed in relation to previous studies of excimer laser stimulated growth of InP.

193-nm excimer-laser-induced densification of fused silica

1996 ◽  
Vol 21 (24) ◽  
pp. 1960 ◽  
Author(s):  
Douglas C. Allan ◽  
Charlene Smith ◽  
N. F. Borrelli ◽  
T. P. Seward
Keyword(s):  
Excimer Laser ◽  
Fused Silica ◽  
193 Nm

Zinc ion and neutral emission from single crystal zinc oxide during 193-nm excimer laser exposure

2011 ◽  
Author(s):  
Enamul Khan ◽  
S. C. Langford ◽  
L. A. Boatner ◽  
J. T. Dickinson
Keyword(s):  
Zinc Oxide ◽  
Single Crystal ◽  
Excimer Laser ◽  
Zinc Ion ◽  
Laser Exposure ◽  
193 Nm

Excimer-laser-induced degradation of fused silica and calcium fluoride for 193-nm lithographic applications

1999 ◽  
Vol 24 (1) ◽  
pp. 58 ◽  
Author(s):  
V. Liberman ◽  
M. Rothschild ◽  
J. H. C. Sedlacek ◽  
R. S. Uttaro ◽  
A. Grenville ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Calcium Fluoride ◽  
Fused Silica ◽  
193 Nm

Behavior of fused silica irradiated by a low-level 193-nm excimer laser for tens of billions of pulses

2001 ◽  
Author(s):  
Chris K. Van Peski ◽  
Zsolt Bor ◽  
Todd J. Embree ◽  
Richard G. Morton
Keyword(s):  
Excimer Laser ◽  
Fused Silica ◽  
Low Level ◽  
193 Nm

Imaging projection lens for excimer laser micromachining

2000 ◽  
Author(s):  
Ying Wan ◽  
Tiechuan Zuo ◽  
Yijian Jiang
Keyword(s):  
Excimer Laser ◽  
Laser Micromachining ◽  
Projection Lens
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