Compaction and rarefaction of fused silica with 193-nm excimer laser exposure

2003 ◽  
Author(s):  
J. Martin Algots ◽  
Richard Sandstrom ◽  
William N. Partlo ◽  
Petar Maroevic ◽  
Eric Eva ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Fused Silica ◽  
Laser Exposure ◽  
193 Nm

Production of Electronically Excited P2 and in from ArF Excimer Laser Irradiation of InP

1986 ◽  
Vol 75 ◽  
Author(s):  
V. M. Donnelly ◽  
V. R. McCrary ◽  
D. Brasen
Keyword(s):  
Excimer Laser ◽  
Laser Frequency ◽  
Laser Exposure ◽  
Resonance Fluorescence ◽  
Thermally Activated ◽  
Ejection Process ◽  
Electronically Excited ◽  
Excimer Laser Irradiation ◽  
Arf Excimer Laser ◽  
193 Nm

AbstractWe have investigated the decomposition of single-crystal InP surfaces irradiated by a 193 nm ArF excimer laser. These studies provide insight into mechanisms of thermal decomposition, surface diffusion and epitaxy. Pulsed laser exposure leads to evolution of P2 from the surface which is detected by resonance fluorescence resulting from a fortuitous overlap of the v″ = 0 with the laser frequency. P2-evolution occurs above a threshold fluence of 0.12 J/cm2 and lags the peak laser intensity by ∼20 nsec. These observations are explained by a thermally activated decomposition mechanism, as opposed to any direct, photochemical ejection process. Peak surface temperatures have been calculated and are used to predict P2 yields as a function of fluence and time which are in good agreement with experiments. These findings are also discussed in relation to previous studies of excimer laser stimulated growth of InP.

193-nm excimer-laser-induced densification of fused silica

1996 ◽  
Vol 21 (24) ◽  
pp. 1960 ◽  
Author(s):  
Douglas C. Allan ◽  
Charlene Smith ◽  
N. F. Borrelli ◽  
T. P. Seward
Keyword(s):  
Excimer Laser ◽  
Fused Silica ◽  
193 Nm

Zinc ion and neutral emission from single crystal zinc oxide during 193-nm excimer laser exposure

2011 ◽  
Author(s):  
Enamul Khan ◽  
S. C. Langford ◽  
L. A. Boatner ◽  
J. T. Dickinson
Keyword(s):  
Zinc Oxide ◽  
Single Crystal ◽  
Excimer Laser ◽  
Zinc Ion ◽  
Laser Exposure ◽  
193 Nm

Excimer-laser-induced degradation of fused silica and calcium fluoride for 193-nm lithographic applications

1999 ◽  
Vol 24 (1) ◽  
pp. 58 ◽  
Author(s):  
V. Liberman ◽  
M. Rothschild ◽  
J. H. C. Sedlacek ◽  
R. S. Uttaro ◽  
A. Grenville ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Calcium Fluoride ◽  
Fused Silica ◽  
193 Nm

Behavior of fused silica irradiated by a low-level 193-nm excimer laser for tens of billions of pulses

2001 ◽  
Author(s):  
Chris K. Van Peski ◽  
Zsolt Bor ◽  
Todd J. Embree ◽  
Richard G. Morton
Keyword(s):  
Excimer Laser ◽  
Fused Silica ◽  
Low Level ◽  
193 Nm

Densification of fused silica under 193-nm excitation

1997 ◽  
Vol 14 (7) ◽  
pp. 1606 ◽  
Author(s):  
N. F. Borrelli ◽  
Charlene Smith ◽  
Douglas C. Allan ◽  
T. P. Seward
Keyword(s):  
Fused Silica ◽  
193 Nm

Melting threshold of crystalline and amorphized Si irradiated with a pulsed ArF (193 nm) excimer laser

1988 ◽  
Vol 45 (4) ◽  
pp. 361-364 ◽  
Author(s):  
F. Foulon ◽  
E. Fogarassy ◽  
A. Slaoui ◽  
C. Fuchs ◽  
S. Unamuno ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Melting Threshold ◽  
193 Nm
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