Zinc ion and neutral emission from single crystal zinc oxide during 193-nm excimer laser exposure

2011 ◽  
Author(s):  
Enamul Khan ◽  
S. C. Langford ◽  
L. A. Boatner ◽  
J. T. Dickinson
2013 ◽  
Vol 114 (5) ◽  
pp. 053511 ◽  
Author(s):  
Enamul H. Khan ◽  
S. C. Langford ◽  
J. T. Dickinson ◽  
L. A. Boatner

2012 ◽  
Vol 111 (6) ◽  
pp. 063101 ◽  
Author(s):  
Enamul H. Khan ◽  
S. C. Langford ◽  
J. T. Dickinson ◽  
L. A. Boatner

1986 ◽  
Vol 75 ◽  
Author(s):  
V. M. Donnelly ◽  
V. R. McCrary ◽  
D. Brasen

AbstractWe have investigated the decomposition of single-crystal InP surfaces irradiated by a 193 nm ArF excimer laser. These studies provide insight into mechanisms of thermal decomposition, surface diffusion and epitaxy. Pulsed laser exposure leads to evolution of P2 from the surface which is detected by resonance fluorescence resulting from a fortuitous overlap of the v″ = 0 with the laser frequency. P2-evolution occurs above a threshold fluence of 0.12 J/cm2 and lags the peak laser intensity by ∼20 nsec. These observations are explained by a thermally activated decomposition mechanism, as opposed to any direct, photochemical ejection process. Peak surface temperatures have been calculated and are used to predict P2 yields as a function of fluence and time which are in good agreement with experiments. These findings are also discussed in relation to previous studies of excimer laser stimulated growth of InP.


1989 ◽  
Vol 158 ◽  
Author(s):  
Abdelilah Slaoui ◽  
Francois Foulon ◽  
Eric Fogarassy ◽  
Paul Siffert

ABSTRACTChemical doping of single-crystal silicon in a PF5 atmosphere is performed byirradiation with an ArF excimer laser working at 193 nm. We have investigated the dependence of doping parameters such as the number of pulses and PF5 gas pressure on the sheet resistance and the impurity concentration profiles. From these results, it is found that phosphorus atoms are produced by pyrolysis of PF5 molecules adsorbed (chemisorbed at low pressure and physisorbed at pressure higher than 1 Torr) on thesilicon surface. As for the incorporation mechanism, it is shown that the process is external rate limited for doping in PF5 ambient whereas mainly diffusion limitedfor doping using only the chemisorbed layer.


2003 ◽  
Author(s):  
J. Martin Algots ◽  
Richard Sandstrom ◽  
William N. Partlo ◽  
Petar Maroevic ◽  
Eric Eva ◽  
...  

2006 ◽  
Vol 17 (9) ◽  
pp. 835-839 ◽  
Author(s):  
M. R. Towler ◽  
S. Kenny ◽  
D. Boyd ◽  
T. Pembroke ◽  
M. Buggy ◽  
...  
Keyword(s):  
Zinc Ion ◽  

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