Excimer-laser-induced degradation of fused silica and calcium fluoride for 193-nm lithographic applications

1999 ◽  
Vol 24 (1) ◽  
pp. 58 ◽  
Author(s):  
V. Liberman ◽  
M. Rothschild ◽  
J. H. C. Sedlacek ◽  
R. S. Uttaro ◽  
A. Grenville ◽  
...  
1999 ◽  
Author(s):  
Vladimir Liberman ◽  
Mordechai Rothschild ◽  
Jan H. C. Sedlacek ◽  
Ray S. Uttaro ◽  
Allen K. Bates ◽  
...  
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1996 ◽  
Vol 21 (24) ◽  
pp. 1960 ◽  
Author(s):  
Douglas C. Allan ◽  
Charlene Smith ◽  
N. F. Borrelli ◽  
T. P. Seward
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1998 ◽  
Vol 37 (25) ◽  
pp. 5964 ◽  
Author(s):  
Rajeev Gupta ◽  
John H. Burnett ◽  
Ulf Griesmann ◽  
Matthew Walhout

2001 ◽  
Author(s):  
Chris K. Van Peski ◽  
Zsolt Bor ◽  
Todd J. Embree ◽  
Richard G. Morton
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2003 ◽  
Author(s):  
J. Martin Algots ◽  
Richard Sandstrom ◽  
William N. Partlo ◽  
Petar Maroevic ◽  
Eric Eva ◽  
...  

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