Behavior of fused silica irradiated by a low-level 193-nm excimer laser for tens of billions of pulses

2001 ◽  
Author(s):  
Chris K. Van Peski ◽  
Zsolt Bor ◽  
Todd J. Embree ◽  
Richard G. Morton
Keyword(s):  
Excimer Laser ◽  
Fused Silica ◽  
Low Level ◽  
193 Nm

193-nm excimer-laser-induced densification of fused silica

1996 ◽  
Vol 21 (24) ◽  
pp. 1960 ◽  
Author(s):  
Douglas C. Allan ◽  
Charlene Smith ◽  
N. F. Borrelli ◽  
T. P. Seward
Keyword(s):  
Excimer Laser ◽  
Fused Silica ◽  
193 Nm

Excimer-laser-induced degradation of fused silica and calcium fluoride for 193-nm lithographic applications

1999 ◽  
Vol 24 (1) ◽  
pp. 58 ◽  
Author(s):  
V. Liberman ◽  
M. Rothschild ◽  
J. H. C. Sedlacek ◽  
R. S. Uttaro ◽  
A. Grenville ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Calcium Fluoride ◽  
Fused Silica ◽  
193 Nm

Compaction and rarefaction of fused silica with 193-nm excimer laser exposure

2003 ◽  
Author(s):  
J. Martin Algots ◽  
Richard Sandstrom ◽  
William N. Partlo ◽  
Petar Maroevic ◽  
Eric Eva ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Fused Silica ◽  
Laser Exposure ◽  
193 Nm

Densification of fused silica under 193-nm excitation

1997 ◽  
Vol 14 (7) ◽  
pp. 1606 ◽  
Author(s):  
N. F. Borrelli ◽  
Charlene Smith ◽  
Douglas C. Allan ◽  
T. P. Seward
Keyword(s):  
Fused Silica ◽  
193 Nm

Melting threshold of crystalline and amorphized Si irradiated with a pulsed ArF (193 nm) excimer laser

1988 ◽  
Vol 45 (4) ◽  
pp. 361-364 ◽  
Author(s):  
F. Foulon ◽  
E. Fogarassy ◽  
A. Slaoui ◽  
C. Fuchs ◽  
S. Unamuno ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Melting Threshold ◽  
193 Nm

Long-term 193-nm laser-induced degradation of fused silica and calcium fluoride

1999 ◽  
Author(s):  
Vladimir Liberman ◽  
Mordechai Rothschild ◽  
Jan H. C. Sedlacek ◽  
Ray S. Uttaro ◽  
Allen K. Bates ◽  
...  
Keyword(s):  
Calcium Fluoride ◽  
Fused Silica ◽  
193 Nm
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