Investigation of e-beam sensitive negative-tone chemically amplified resists for binary mask making

2003 ◽  
Author(s):  
Mathias Irmscher ◽  
Lothar Berger ◽  
Dirk Beyer ◽  
Joerg Butschke ◽  
Peter Dress ◽  
...  
Keyword(s):  
Binary Mask ◽  
Chemically Amplified ◽  
Mask Making ◽  
Negative Tone ◽  
Chemically Amplified Resists

Resist composition effects on ultimate resolution of negative-tone chemically amplified resists

2001 ◽  
Author(s):  
Laurent Pain ◽  
C. Gourgon ◽  
K. Patterson ◽  
B. Scarfogliere ◽  
Serge V. Tedesco ◽  
...  
Keyword(s):  
Composition Effects ◽  
Chemically Amplified ◽  
Negative Tone ◽  
Chemically Amplified Resists

Comparative evaluation of e-beam sensitive chemically amplified resists for mask making

2002 ◽  
Author(s):  
Mathias Irmscher ◽  
Dirk Beyer ◽  
Joerg Butschke ◽  
Chris Constantine ◽  
Thomas Hoffmann ◽  
...  
Keyword(s):  
Comparative Evaluation ◽  
Chemically Amplified ◽  
Mask Making ◽  
Chemically Amplified Resists

Chemical characteristics of negative-tone chemically amplified resist for advanced mask making

2004 ◽  
Author(s):  
Kazumasa Takeshi ◽  
Naoko Ito ◽  
Daisuke Inokuchi ◽  
Yasushi Nishiyama ◽  
Yuichi Fukushima ◽  
...  
Keyword(s):  
Chemical Characteristics ◽  
Chemically Amplified ◽  
Mask Making ◽  
Chemically Amplified Resist ◽  
Negative Tone

Chemical characteristics of negative-tone chemically amplified resist for advanced mask making: II

2004 ◽  
Author(s):  
Kazumasa Takeshi ◽  
Masahito Tanabe ◽  
Daisuke Inokuchi ◽  
Yuichi Fukushima ◽  
Yasuhiro Okumoto ◽  
...  
Keyword(s):  
Chemical Characteristics ◽  
Chemically Amplified ◽  
Mask Making ◽  
Chemically Amplified Resist ◽  
Negative Tone

High-Resolution Hybrid Lithography with Negative Tone Chemically Amplified Resists

2004 ◽  
Vol 43 (6B) ◽  
pp. 3974-3980 ◽  
Author(s):  
S. Landis ◽  
S. Pauliac ◽  
J. Saint-Pol ◽  
C. Gourgon ◽  
M. Akita ◽  
...  
Keyword(s):  
High Resolution ◽  
Chemically Amplified ◽  
Negative Tone ◽  
Chemically Amplified Resists
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