Automated CD-error compensation for negative-tone chemically amplified resists by zone-controlled post-exposure bake

2003 ◽  
Author(s):  
Lothar Berger ◽  
Peter Dress ◽  
Thomas Gairing ◽  
J. J. Chen ◽  
Ren-Guey Hsieh ◽  
...  
Keyword(s):  
Error Compensation ◽  
Post Exposure ◽  
Chemically Amplified ◽  
Post Exposure Bake ◽  
Negative Tone ◽  
Chemically Amplified Resists

Sub-millisecond post exposure bake of chemically amplified resists by CO 2 laser heat treatment

2010 ◽  
Author(s):  
Byungki Jung ◽  
Jing Sha ◽  
Florencia Paredes ◽  
Christopher K. Ober ◽  
Michael O. Thompson ◽  
...  
Keyword(s):  
Heat Treatment ◽  
Laser Heat Treatment ◽  
Post Exposure ◽  
Chemically Amplified ◽  
Laser Heat ◽  
Post Exposure Bake ◽  
Chemically Amplified Resists

Addressing challenges in lithography using sub-millisecond post exposure bake of chemically amplified resists

2011 ◽  
Author(s):  
Byungki Jung ◽  
Christopher K. Ober ◽  
Michael O. Thompson ◽  
Todd R. Younkin ◽  
Manish Chandhok
Keyword(s):  
Post Exposure ◽  
Chemically Amplified ◽  
Post Exposure Bake ◽  
Chemically Amplified Resists

Resist composition effects on ultimate resolution of negative-tone chemically amplified resists

2001 ◽  
Author(s):  
Laurent Pain ◽  
C. Gourgon ◽  
K. Patterson ◽  
B. Scarfogliere ◽  
Serge V. Tedesco ◽  
...  
Keyword(s):  
Composition Effects ◽  
Chemically Amplified ◽  
Negative Tone ◽  
Chemically Amplified Resists

scholarly journals Time Dependent Behavior of Chemically Amplified Resist Characterized under Sub-millisecond Post Exposure Bake

2011 ◽  
Vol 24 (5) ◽  
pp. 487-490 ◽  
Author(s):  
Byungki Jung ◽  
Manish Chandhok ◽  
Todd R. Younkin ◽  
Christopher K. Ober ◽  
Michael O. Thompson
Keyword(s):  
Time Dependent ◽  
Post Exposure ◽  
Chemically Amplified ◽  
Dependent Behavior ◽  
Chemically Amplified Resist ◽  
Post Exposure Bake
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