Monte Carlo simulation of gel formation and surface and line-edge roughness in negative tone chemically amplified resists

2003 ◽  
Vol 21 (1) ◽  
pp. 254 ◽  
Author(s):  
G. P. Patsis ◽  
N. Glezos ◽  
E. Gogolides
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Gel Formation ◽  
Line Edge Roughness ◽  
Chemically Amplified ◽  
Edge Roughness ◽  
Negative Tone ◽  
Chemically Amplified Resists

scholarly journals Heavy metal incorporated helium ion active hybrid non-chemically amplified resists: Nano-patterning with low line edge roughness

AIP Advances ◽  
2017 ◽  
Vol 7 (8) ◽  
pp. 085314 ◽  
Author(s):  
Pulikanti Guruprasad Reddy ◽  
Neha Thakur ◽  
Chien-Lin Lee ◽  
Sheng-Wei Chien ◽  
Chullikkattil P. Pradeep ◽  
...  
Keyword(s):  
Heavy Metal ◽  
Line Edge Roughness ◽  
Chemically Amplified ◽  
Edge Roughness ◽  
Helium Ion ◽  
Chemically Amplified Resists ◽  
Nano Patterning
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