Chemical characteristics of negative-tone chemically amplified resist for advanced mask making

2004 ◽  
Author(s):  
Kazumasa Takeshi ◽  
Naoko Ito ◽  
Daisuke Inokuchi ◽  
Yasushi Nishiyama ◽  
Yuichi Fukushima ◽  
...  
Keyword(s):  
Chemical Characteristics ◽  
Chemically Amplified ◽  
Mask Making ◽  
Chemically Amplified Resist ◽  
Negative Tone

Chemical characteristics of negative-tone chemically amplified resist for advanced mask making: II

2004 ◽  
Author(s):  
Kazumasa Takeshi ◽  
Masahito Tanabe ◽  
Daisuke Inokuchi ◽  
Yuichi Fukushima ◽  
Yasuhiro Okumoto ◽  
...  
Keyword(s):  
Chemical Characteristics ◽  
Chemically Amplified ◽  
Mask Making ◽  
Chemically Amplified Resist ◽  
Negative Tone

Investigation of e-beam sensitive negative-tone chemically amplified resists for binary mask making

2003 ◽  
Author(s):  
Mathias Irmscher ◽  
Lothar Berger ◽  
Dirk Beyer ◽  
Joerg Butschke ◽  
Peter Dress ◽  
...  
Keyword(s):  
Binary Mask ◽  
Chemically Amplified ◽  
Mask Making ◽  
Negative Tone ◽  
Chemically Amplified Resists

Negative tone chemically amplified resist formulation optimizations for ultra high-resolution lithography

2003 ◽  
Vol 67-68 ◽  
pp. 274-282 ◽  
Author(s):  
J. Saint-Pol ◽  
S. Landis ◽  
C. Gourgon ◽  
S. Tedesco ◽  
R. Hanawa ◽  
...  
Keyword(s):  
High Resolution ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Negative Tone

Development of positive-tone chemically amplified resist for LEEPL mask making

2005 ◽  
Author(s):  
Yoshiyuki Negishi ◽  
Kazumasa Takeshi ◽  
Takashi Yoshii ◽  
Keishi Tanaka ◽  
Yasuhiro Okumoto
Keyword(s):  
Chemically Amplified ◽  
Mask Making ◽  
Chemically Amplified Resist

Mask patterning process using the negative tone chemically amplified resist TOK OEBR-CAN024

2004 ◽  
Author(s):  
Mathias Irmscher ◽  
Dirk Beyer ◽  
Joerg Butschke ◽  
Peter Hudek ◽  
Corinna Koepernik ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Negative Tone

90-nm mask making processes using the positive tone chemically amplified resist FEP171

2003 ◽  
Author(s):  
Joerg Butschke ◽  
Dirk Beyer ◽  
Chris Constantine ◽  
Peter Dress ◽  
Peter Hudek ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Mask Making ◽  
Chemically Amplified Resist
Sign in / Sign up

Export Citation Format

Share Document