Bake condition effect on hybrid lithography process for negative-tone chemically amplified resists

2000 ◽  
Author(s):  
Laurent Pain ◽  
F. Sala ◽  
C. Higgins ◽  
B. Dal'zotto ◽  
Serge V. Tedesco
Keyword(s):  
Lithography Process ◽  
Chemically Amplified ◽  
Condition Effect ◽  
Negative Tone ◽  
Chemically Amplified Resists

Resist composition effects on ultimate resolution of negative-tone chemically amplified resists

2001 ◽  
Author(s):  
Laurent Pain ◽  
C. Gourgon ◽  
K. Patterson ◽  
B. Scarfogliere ◽  
Serge V. Tedesco ◽  
...  
Keyword(s):  
Composition Effects ◽  
Chemically Amplified ◽  
Negative Tone ◽  
Chemically Amplified Resists

Application of a New Empirical Model to the Electron Beam Lithography Process with Chemically Amplified Resists

1998 ◽  
Vol 37 (Part 1, No. 12B) ◽  
pp. 6761-6766 ◽  
Author(s):  
Young-Mog Ham ◽  
Ki-Ho Baik ◽  
Won-Gyu Lee ◽  
Tack Dong Chung ◽  
Kukjin Chun
Keyword(s):  
Electron Beam ◽  
Empirical Model ◽  
Electron Beam Lithography ◽  
Lithography Process ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Investigation of e-beam sensitive negative-tone chemically amplified resists for binary mask making

2003 ◽  
Author(s):  
Mathias Irmscher ◽  
Lothar Berger ◽  
Dirk Beyer ◽  
Joerg Butschke ◽  
Peter Dress ◽  
...  
Keyword(s):  
Binary Mask ◽  
Chemically Amplified ◽  
Mask Making ◽  
Negative Tone ◽  
Chemically Amplified Resists

High-Resolution Hybrid Lithography with Negative Tone Chemically Amplified Resists

2004 ◽  
Vol 43 (6B) ◽  
pp. 3974-3980 ◽  
Author(s):  
S. Landis ◽  
S. Pauliac ◽  
J. Saint-Pol ◽  
C. Gourgon ◽  
M. Akita ◽  
...  
Keyword(s):  
High Resolution ◽  
Chemically Amplified ◽  
Negative Tone ◽  
Chemically Amplified Resists
Sign in / Sign up

Export Citation Format

Share Document