Magnetic properties of ion‐beam sputter deposited NiFe ultrathin films

1995 ◽  
Vol 13 (4) ◽  
pp. 2194-2198 ◽  
Author(s):  
Masaki Ueno ◽  
Shuji Tanoue
Keyword(s):  
Magnetic Properties ◽  
Ultrathin Films ◽  
Ion Beam ◽  
Sputter Deposited

Magnetic properties of ion‐beam sputter‐deposited Fe‐Ni‐B‐Si films

1988 ◽  
Vol 63 (8) ◽  
pp. 4315-4317 ◽  
Author(s):  
J. Ryu ◽  
Y. Huang ◽  
C. Vittoria
Keyword(s):  
Magnetic Properties ◽  
Ion Beam ◽  
Sputter Deposited ◽  
Si Films

Effect of ion-beam bombardment on microstructural and magnetic properties of Ni80Fe20/α-Fe2O3thin films

2014 ◽  
Vol 53 (6S) ◽  
pp. 06JB03 ◽  
Author(s):  
Chao Zheng ◽  
Tien-Chi Lan ◽  
Chin Shueh ◽  
Ryan D. Desautels ◽  
Johan van Lierop ◽  
...  
Keyword(s):  
Magnetic Properties ◽  
Ion Beam

scholarly journals Noble Gas Incorporation in Sputtered and Ion Beam Assisted Grown Silicon Films

1992 ◽  
Vol 262 ◽  
Author(s):  
A. van Veen ◽  
M. J. W. Greuter ◽  
L. Niesen ◽  
B. Nielsen ◽  
K.G. Lynn
Keyword(s):  
Noble Gas ◽  
Ion Beam ◽  
Silicon Layer ◽  
Arrival Rate ◽  
Heavy Ion ◽  
Silicon Films ◽  
Defect Analysis ◽  
Gas Desorption ◽  
Sputter Deposited ◽  
Underlying Mechanisms

ABSTRACTGas desorption measurements have been performed on sputter deposited silicon films. The sputter gas was argon or krypton. Parameters influencing the incorporation process e.g. bias voltage, substrate temperature and arrival rate ratio of silicon and noble gas atoms have been systematically varied. The films, a-Si and c-Si, have been characterised by various techniques for composition and defect analysis. A model has been applied to describe the composition of the growing silicon layer. Underlying mechanisms like gas-gas sputtering have been studied in separate ion implantation experiments. For a-Si concentrations as high as 6% Ar and Kr have been found. An important effect is the injection of self- interstitial atoms caused by the low energy heavy ion bombardment. It causes the layer to grow without large open volume defects.

Influence of the interface on the magnetic properties of ferromagnetic ultrathin films with various adjacent copper thicknesses

2014 ◽  
Vol 115 (17) ◽  
pp. 17C108 ◽  
Author(s):  
Dong Zhang ◽  
Sheng Jiang ◽  
Chen Luo ◽  
Yukun Wang ◽  
Wenbin Rui ◽  
...  
Keyword(s):  
Magnetic Properties ◽  
Ultrathin Films

Fluorine-ion-beam modification of magnetic properties of thin GaMnAs films

2015 ◽  
Vol 117 (17) ◽  
pp. 17B909 ◽  
Author(s):  
S. L. A. Mello ◽  
M. M. Sant'Anna ◽  
C. F. S. Codeço ◽  
S. N. Dong ◽  
T. Yoo ◽  
...  
Keyword(s):  
Magnetic Properties ◽  
Ion Beam ◽  
Ion Beam Modification

Magnetic characterization of ion-beam sputter deposited permalloy thin films

1992 ◽  
Vol 104-107 ◽  
pp. 1847-1850 ◽  
Author(s):  
Michael A. Russak ◽  
Christopher V. Jahnes ◽  
Erik Klokholm ◽  
Bojan Petek
Keyword(s):  
Thin Films ◽  
Ion Beam ◽  
Magnetic Characterization ◽  
Sputter Deposited ◽  
Permalloy Thin Films

Effect of Ar Gas Pressure on Magnetic Properties of Sputter-Deposited Fe–Cu Alloys

1989 ◽  
Vol 28 (Part 1, No. 3) ◽  
pp. 361-367 ◽  
Author(s):  
Kenji Sumiyama ◽  
Koichi Takemura ◽  
Noriyuki Kataoka ◽  
Yoji Nakamura
Keyword(s):  
Magnetic Properties ◽  
Gas Pressure ◽  
Cu Alloys ◽  
Sputter Deposited ◽  
Ar Gas

Ion-beam sputter-deposited SiN/TiN attenuating phase-shift photoblanks

2001 ◽  
Author(s):  
Laurent Dieu ◽  
Peter F. Carcia ◽  
Hideaki Mitsui ◽  
Kunihiko Ueno
Keyword(s):  
Phase Shift ◽  
Ion Beam ◽  
Sputter Deposited
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