Magnetic properties of ion‐beam sputter‐deposited Fe‐Ni‐B‐Si films

1988 ◽  
Vol 63 (8) ◽  
pp. 4315-4317 ◽  
Author(s):  
J. Ryu ◽  
Y. Huang ◽  
C. Vittoria
Keyword(s):  
Magnetic Properties ◽  
Ion Beam ◽  
Sputter Deposited ◽  
Si Films

Nanocrystalline silicon ( nc-Si ) from single ion beam sputtering

2003 ◽  
Vol 762 ◽  
Author(s):  
Z.B. Zhou ◽  
G.M. Hadi ◽  
R.Q. Cui ◽  
Z.M. Ding ◽  
G. Li
Keyword(s):  
Solar Cell ◽  
Ion Beam ◽  
Nanocrystalline Silicon ◽  
Silicon Films ◽  
Chamber Pressure ◽  
Ion Beam Sputtering ◽  
High Hydrogen ◽  
Beam Sputtering ◽  
Si Films ◽  
Nanocrystalline Silicon Films

AbstractBased on a small set of selected publications on the using of nanocrystalline silicon films (nc-Si) for solar cell from 1997 to 2001, this paper reviews the application of nc-Si films as intrinsic layers in p-i-n solar cells. The new structure of nc-Si films deposited at high chamber pressure and high hydrogen dilution have characters of nanocrystalline grains with dimension about several tens of nanometer embedded in matrix of amorphous tissue and a high volume fraction of crystallinity (60~80%). The new nc-Si material have optical gap of 1.89 eV. The efficiency of this single junction solar cell reaches 8.7%. This nc-Si layer can be used not only as an intrinsic layer and as a p-type layer. Also nanocrystalline layer may be used as a seed layer for the growth of polycrystalline Si films at a low temperature.We used single ion beam sputtering methods to synthesize nanocrystalline silicon films successfully. The films were characterized with the technique of X-ray diffraction, Atomic Force Micrographs. We found that the films had a character of nc-amorphous double phase structure. Conductivity test at different temperatures presented the transportation of electrons dominated by different mechanism within different temperature ranges. Photoconductivity gains of the material were obtained in our recent investigation.

Effect of ion-beam bombardment on microstructural and magnetic properties of Ni80Fe20/α-Fe2O3thin films

2014 ◽  
Vol 53 (6S) ◽  
pp. 06JB03 ◽  
Author(s):  
Chao Zheng ◽  
Tien-Chi Lan ◽  
Chin Shueh ◽  
Ryan D. Desautels ◽  
Johan van Lierop ◽  
...  
Keyword(s):  
Magnetic Properties ◽  
Ion Beam

scholarly journals Noble Gas Incorporation in Sputtered and Ion Beam Assisted Grown Silicon Films

1992 ◽  
Vol 262 ◽  
Author(s):  
A. van Veen ◽  
M. J. W. Greuter ◽  
L. Niesen ◽  
B. Nielsen ◽  
K.G. Lynn
Keyword(s):  
Noble Gas ◽  
Ion Beam ◽  
Silicon Layer ◽  
Arrival Rate ◽  
Heavy Ion ◽  
Silicon Films ◽  
Defect Analysis ◽  
Gas Desorption ◽  
Sputter Deposited ◽  
Underlying Mechanisms

ABSTRACTGas desorption measurements have been performed on sputter deposited silicon films. The sputter gas was argon or krypton. Parameters influencing the incorporation process e.g. bias voltage, substrate temperature and arrival rate ratio of silicon and noble gas atoms have been systematically varied. The films, a-Si and c-Si, have been characterised by various techniques for composition and defect analysis. A model has been applied to describe the composition of the growing silicon layer. Underlying mechanisms like gas-gas sputtering have been studied in separate ion implantation experiments. For a-Si concentrations as high as 6% Ar and Kr have been found. An important effect is the injection of self- interstitial atoms caused by the low energy heavy ion bombardment. It causes the layer to grow without large open volume defects.

Fluorine-ion-beam modification of magnetic properties of thin GaMnAs films

2015 ◽  
Vol 117 (17) ◽  
pp. 17B909 ◽  
Author(s):  
S. L. A. Mello ◽  
M. M. Sant'Anna ◽  
C. F. S. Codeço ◽  
S. N. Dong ◽  
T. Yoo ◽  
...  
Keyword(s):  
Magnetic Properties ◽  
Ion Beam ◽  
Ion Beam Modification

Magnetic characterization of ion-beam sputter deposited permalloy thin films

1992 ◽  
Vol 104-107 ◽  
pp. 1847-1850 ◽  
Author(s):  
Michael A. Russak ◽  
Christopher V. Jahnes ◽  
Erik Klokholm ◽  
Bojan Petek
Keyword(s):  
Thin Films ◽  
Ion Beam ◽  
Magnetic Characterization ◽  
Sputter Deposited ◽  
Permalloy Thin Films

Effect of Ar Gas Pressure on Magnetic Properties of Sputter-Deposited Fe–Cu Alloys

1989 ◽  
Vol 28 (Part 1, No. 3) ◽  
pp. 361-367 ◽  
Author(s):  
Kenji Sumiyama ◽  
Koichi Takemura ◽  
Noriyuki Kataoka ◽  
Yoji Nakamura
Keyword(s):  
Magnetic Properties ◽  
Gas Pressure ◽  
Cu Alloys ◽  
Sputter Deposited ◽  
Ar Gas
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