Secondary ion mass spectrometry analysis of implanted and rapid thermal processing annealed wafers for sub-100 nanometer technology

Author(s):  
U. Ehrke ◽  
A. Sears ◽  
W. Lerch ◽  
S. Paul ◽  
G. Roters ◽  
...  
2015 ◽  
Vol 87 (15) ◽  
pp. 7795-7802 ◽  
Author(s):  
Rainer Kassenböhmer ◽  
Felix Draude ◽  
Martin Körsgen ◽  
Andreas Pelster ◽  
Heinrich F. Arlinghaus

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