Secondary ion mass spectrometry analysis of Be doped GaAs/AlGaAs heterostructures

L. C. Hopkins; J. Nagle; R. J. Malik

doi:10.1116/1.577921

Secondary ion mass spectrometry analysis of Be doped GaAs/AlGaAs heterostructures

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.577921 ◽

1992 ◽

Vol 10 (4) ◽

pp. 2843-2845

Author(s):

L. C. Hopkins ◽

J. Nagle ◽

R. J. Malik

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Mass Spectrometry Analysis ◽

Spectrometry Analysis ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Static secondary ion mass spectrometry analysis of UV photopolymerization in diacetylene thin films

Langmuir ◽

10.1021/la00059a010 ◽

1991 ◽

Vol 7 (11) ◽

pp. 2454-2459 ◽

Cited By ~ 5

Author(s):

Paula A. Cornelio-Clark ◽

Joseph A. Gardella

Keyword(s):

Mass Spectrometry ◽

Thin Films ◽

Secondary Ion Mass Spectrometry ◽

Mass Spectrometry Analysis ◽

Spectrometry Analysis ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Quantitative static Time-of-Flight Secondary Ion Mass Spectrometry analysis of anionic minority species in microelectronic substrates

Applied Surface Science ◽

10.1016/j.apsusc.2008.06.045 ◽

2008 ◽

Vol 255 (4) ◽

pp. 1415-1418 ◽

Cited By ~ 3

Author(s):

X. Ravanel ◽

C. Trouiller ◽

M. Juhel ◽

C. Wyon ◽

L.F.Tz. Kwakman ◽

...

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Mass Spectrometry Analysis ◽

Spectrometry Analysis ◽

Ion Mass Spectrometry ◽

Minority Species ◽

Secondary Ion

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Summary Abstract: High sputter rate secondary ion mass spectrometry analysis of insulators used in microelectronics and lightwave applications

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.575189 ◽

1988 ◽

Vol 6 (3) ◽

pp. 2082-2084 ◽

Cited By ~ 6

Author(s):

F. A. Stevie ◽

V. V. S. Rana ◽

A. S. Harrus ◽

T. H. Briggs ◽

Perry Skeath

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Mass Spectrometry Analysis ◽

Spectrometry Analysis ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Calculation of Membrane Lipid Ratios Using Single-Pixel Time-of-Flight Secondary Ion Mass Spectrometry Analysis

Analytical Chemistry ◽

10.1021/acs.analchem.5b01456 ◽

2015 ◽

Vol 87 (15) ◽

pp. 7795-7802 ◽

Cited By ~ 1

Author(s):

Rainer Kassenböhmer ◽

Felix Draude ◽

Martin Körsgen ◽

Andreas Pelster ◽

Heinrich F. Arlinghaus

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Membrane Lipid ◽

Mass Spectrometry Analysis ◽

Spectrometry Analysis ◽

Lipid Ratios ◽

Ion Mass Spectrometry ◽

Secondary Ion ◽

Single Pixel

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Approach for a three-dimensional on-chip quantification by secondary-ion mass spectrometry analysis

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580872 ◽

1997 ◽

Vol 15 (3) ◽

pp. 445-451 ◽

Cited By ~ 5

Author(s):

Hubert Gnaser

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Three Dimensional ◽

Mass Spectrometry Analysis ◽

Spectrometry Analysis ◽

Ion Mass Spectrometry ◽

On Chip ◽

Secondary Ion

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Secondary ion mass spectrometry analysis strategy for shallow junctions on test and product silicon wafers

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.586353 ◽

1992 ◽

Vol 10 (1) ◽

pp. 323 ◽

Cited By ~ 9

Author(s):

F. A. Stevie

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Silicon Wafers ◽

Mass Spectrometry Analysis ◽

Spectrometry Analysis ◽

Shallow Junctions ◽

Ion Mass Spectrometry ◽

Analysis Strategy ◽

Secondary Ion

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Quantitative secondary ion mass spectrometry analysis of impurities in GaN and AlxGa1−xN films using molecular ions MCs+ and MCs2+

Applied Surface Science ◽

10.1016/s0169-4332(98)00815-0 ◽

1999 ◽

Vol 144-145 ◽

pp. 306-309 ◽

Cited By ~ 5

Author(s):

C Hongo ◽

M Tomita ◽

M Suzuki

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Molecular Ions ◽

Mass Spectrometry Analysis ◽

Spectrometry Analysis ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Use of two beam energies in secondary ion mass spectrometry analysis of shallow implants: Resolution-matched profiling

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.591218 ◽

2000 ◽

Vol 18 (1) ◽

pp. 493 ◽

Cited By ~ 5

Author(s):

G. A. Cooke ◽

T. J. Ormsby ◽

M. G. Dowsett ◽

C. Parry ◽

A. Murrell ◽

...

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Mass Spectrometry Analysis ◽

Spectrometry Analysis ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Secondary ion mass spectrometry analysis of ultrathin impurity layers in semiconductors and their use in quantification, instrumental assessment, and fundamental measurements

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.587180 ◽

1994 ◽

Vol 12 (1) ◽

pp. 186 ◽

Cited By ~ 60

Author(s):

M. G. Dowsett

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Mass Spectrometry Analysis ◽

Spectrometry Analysis ◽

Instrumental Assessment ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Test structures for secondary ion mass spectrometry analysis of patterned silicon wafers

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.577724 ◽

1992 ◽

Vol 10 (4) ◽

pp. 2880-2886 ◽

Cited By ~ 4

Author(s):

F. A. Stevie ◽

G. W. Cochran ◽

P. M. Kahora ◽

W. A. Russell ◽

N. Linde ◽

...

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Silicon Wafers ◽

Mass Spectrometry Analysis ◽

Spectrometry Analysis ◽

Ion Mass Spectrometry ◽

Secondary Ion

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