Incorporating a corner correction scheme into enhanced pattern area density proximity effect correction

C. S. Ea; A. D. Brown

doi:10.1116/1.1396642

Incorporating a corner correction scheme into enhanced pattern area density proximity effect correction

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1396642 ◽

2001 ◽

Vol 19 (5) ◽

pp. 1985 ◽

Cited By ~ 6

Author(s):

C. S. Ea ◽

A. D. Brown

Keyword(s):

Proximity Effect ◽

Area Density ◽

Correction Scheme ◽

Proximity Effect Correction

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Dose modification proximity effect correction scheme with inherent forward scattering corrections

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.589635 ◽

1997 ◽

Vol 15 (6) ◽

pp. 2309 ◽

Cited By ~ 11

Author(s):

G. Patrick Watson

Keyword(s):

Proximity Effect ◽

Forward Scattering ◽

Dose Modification ◽

Correction Scheme ◽

Proximity Effect Correction

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Proximity effect correction using pattern shape modification and area density map

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1313576 ◽

2000 ◽

Vol 18 (6) ◽

pp. 3150 ◽

Cited By ~ 9

Author(s):

Kimitoshi Takahashi ◽

Morimi Osawa ◽

Masami Sato ◽

Hiroshi Arimoto ◽

Kozo Ogino ◽

...

Keyword(s):

Proximity Effect ◽

Shape Modification ◽

Area Density ◽

Pattern Shape ◽

Density Map ◽

Proximity Effect Correction

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Model based hybrid proximity effect correction scheme combining dose modulation and shape adjustments

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.3662879 ◽

2011 ◽

Vol 29 (6) ◽

pp. 06F315 ◽

Cited By ~ 10

Author(s):

Thomas Klimpel ◽

Martin Schulz ◽

Rainer Zimmermann ◽

Hans-Jürgen Stock ◽

Alex Zepka

Keyword(s):

Proximity Effect ◽

Model Based ◽

Correction Scheme ◽

Dose Modulation ◽

Proximity Effect Correction

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Proximity-effect correction for EPL by using multiple pattern-area-density maps and pattern classification

10.1117/12.504235 ◽

2003 ◽

Cited By ~ 1

Author(s):

Fumio Murai ◽

Hiroshi Fukuda ◽

Shigeki Mori ◽

Akio Sato ◽

Kyoji Nakajo

Keyword(s):

Pattern Classification ◽

Proximity Effect ◽

Area Density ◽

Density Maps ◽

Proximity Effect Correction

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Application of the GHOST proximity effect correction scheme to round beam and shaped beam electron lithography systems

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.583200 ◽

1985 ◽

Vol 3 (1) ◽

pp. 153 ◽

Cited By ~ 5

Author(s):

Geraint Owen

Keyword(s):

Proximity Effect ◽

Beam Electron ◽

Shaped Beam ◽

Correction Scheme ◽

Proximity Effect Correction ◽

Electron Lithography

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Enhanced pattern area density proximity effect correction

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.590559 ◽

1999 ◽

Vol 17 (2) ◽

pp. 323 ◽

Cited By ~ 6

Author(s):

C. S. Ea ◽

A. D. Brown

Keyword(s):

Proximity Effect ◽

Area Density ◽

Proximity Effect Correction

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Fast proximity effect correction method using a pattern area density map

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.585931 ◽

1992 ◽

Vol 10 (6) ◽

pp. 3072 ◽

Cited By ~ 28

Author(s):

Fumio Murai

Keyword(s):

Proximity Effect ◽

Correction Method ◽

Area Density ◽

Density Map ◽

Proximity Effect Correction

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Proximity effect correction using multilevel area density maps for character projection based electron beam direct writing toward 14 nm node and beyond

10.1117/12.916353 ◽

2012 ◽

Cited By ~ 1

Author(s):

Kozo Ogino ◽

Hiromi Hoshino ◽

Takashi Maruyama ◽

Yasuhide Machida ◽

Shinji Sugatani

Keyword(s):

Electron Beam ◽

Proximity Effect ◽

Direct Writing ◽

Area Density ◽

Density Maps ◽

Proximity Effect Correction

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Development of An Integrated Proximity Effect Correction Scheme

10.21236/ada398804 ◽

2001 ◽

Author(s):

Soo-Young Lee

Keyword(s):

Proximity Effect ◽

Correction Scheme ◽

Proximity Effect Correction

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Proximity effect correction using pattern shape modification and area density map for electron-beam projection lithography

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1410090 ◽

2001 ◽

Vol 19 (6) ◽

pp. 2483 ◽

Cited By ~ 35

Author(s):

Morimi Osawa ◽

Kimitoshi Takahashi ◽

Masami Sato ◽

Hiroshi Arimoto ◽

Kozo Ogino ◽

...

Keyword(s):

Electron Beam ◽

Proximity Effect ◽

Shape Modification ◽

Area Density ◽

Projection Lithography ◽

Pattern Shape ◽

Density Map ◽

Beam Projection ◽

Proximity Effect Correction

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