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Understanding defect kinetics in ultra-thin dielectric logic and memory devices using random telegraph noise analysis
2015 IEEE 22nd International Symposium on the Physical and Failure Analysis of Integrated Circuits
◽
10.1109/ipfa.2015.7224354
◽
2015
◽
Author(s):
N. Raghavan
◽
W. H. Liu
◽
R. Thamankar
◽
M. Bosman
◽
K. L. Pey
Keyword(s):
Noise Analysis
◽
Memory Devices
◽
Random Telegraph Noise
◽
Telegraph Noise
Download Full-text
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Random Telegraph Noise analysis as a tool to link physical device features to electrical reliability in nanoscale devices
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Author(s):
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Tsung-Hsien Kao
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Shoou-Jinn Chang
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Yean-Kuen Fang
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Po-Chin Huang
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Chien-Ming Lai
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...
Keyword(s):
Field Effect
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Field Effect Transistors
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Noise Analysis
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Metal Oxide Semiconductor
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Metal Gate
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Random Telegraph Noise modulation by switching bias in Floating Gate memory devices
10.1063/1.2759649
◽
2007
◽
Author(s):
Paolo Fantini
◽
Alessandro Calderoni
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Andrea Marinoni
Keyword(s):
Floating Gate
◽
Memory Devices
◽
Random Telegraph Noise
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Telegraph Noise
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Floating Gate Memory
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Multi-level resistance switching and random telegraph noise analysis of nitride based memristors
Chaos Solitons & Fractals
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10.1016/j.chaos.2021.111533
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2021
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Panagiotis Loukas
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Panagiotis Karakolis
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Vassilios Ioannou-Sougleridis
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Keyword(s):
Noise Analysis
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Resistance Switching
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Random Telegraph Noise
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Investigation of random telegraph noise amplitudes in hafnium oxide resistive memory devices
2014 IEEE International Reliability Physics Symposium
◽
10.1109/irps.2014.6861157
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2014
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Author(s):
Y. T. Chung
◽
Y. H. Liu
◽
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Y. H. Cheng
◽
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...
Keyword(s):
Hafnium Oxide
◽
Memory Devices
◽
Resistive Memory
◽
Random Telegraph Noise
◽
Telegraph Noise
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Modeling of electron conduction in contact resistive random access memory devices as random telegraph noise
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10.1063/1.3691224
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◽
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Keyword(s):
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◽
Random Access Memory
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Memory Devices
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Impact of Nonuniform Doping on Random Telegraph Noise in Flash Memory Devices
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◽
10.1109/ted.2011.2175399
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2012
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pp. 309-315
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Author(s):
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◽
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◽
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Flash Memory
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Random Telegraph Noise
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Investigation of Trap Properties in High-k/Metal Gate p-Type Metal–Oxide–Semiconductor Field-Effect Transistors with SiGe Source/Drain Using Random Telegraph Noise Analysis
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◽
10.7567/apex.6.084201
◽
2013
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Vol 6
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◽
pp. 084201
Author(s):
San-Lein Wu
◽
Kai-Shiang Tsai
◽
Osbert Cheng
Keyword(s):
Field Effect
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Field Effect Transistors
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Noise Analysis
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Review of Scientific Instruments
◽
10.1063/1.1150519
◽
2000
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◽
pp. 1681-1688
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Cited By ~ 61
Author(s):
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◽
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Keyword(s):
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Noise Analysis
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Random Telegraph Noise
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Telegraph Noise
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