A comparative study of the light-induced defects in intrinsic amorphous and microcrystalline silicon deposited by remote plasma enhanced chemical vapor deposition

Mapping Intimacies ◽

10.1063/1.41030 ◽

1991 ◽

Cited By ~ 8

Author(s):

M. J. Williams ◽

Cheng Wang ◽

G. Lucovsky

Keyword(s):

Chemical Vapor Deposition ◽

Comparative Study ◽

Vapor Deposition ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Remote Plasma ◽

Induced Defects

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Comparative study of microcrystalline silicon films prepared in low or high pressure regime by hot-wire chemical vapor deposition

Journal of Non-Crystalline Solids ◽

10.1016/s0022-3093(99)00738-3 ◽

2000 ◽

Vol 266-269 ◽

pp. 385-390 ◽

Cited By ~ 3

Author(s):

C Niikura ◽

J Guillet ◽

R Brenot ◽

B Equer ◽

J.E Bourée ◽

...

Keyword(s):

High Pressure ◽

Chemical Vapor Deposition ◽

Comparative Study ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Films ◽

Hot Wire ◽

Microcrystalline Silicon ◽

Pressure Regime

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Microcrystalline Silicon Film Deposition from H 2 ‐ He ‐ SiH4 Using Remote Plasma Enhanced Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.1838733 ◽

1998 ◽

Vol 145 (8) ◽

pp. 2900-2904 ◽

Cited By ~ 13

Author(s):

Sung‐Woo Lee ◽

Du‐Chang Heo ◽

Jin‐Kyu Kang ◽

Young‐Bae Park ◽

Shi‐Woo Rhee

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Silicon Film ◽

Chemical Vapor ◽

Film Deposition ◽

Microcrystalline Silicon ◽

Remote Plasma ◽

Microcrystalline Silicon Film

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Growth of microcrystalline silicon by remote plasma chemical vapor deposition without hydrogen dilution

Journal of Applied Physics ◽

10.1063/1.356143 ◽

1994 ◽

Vol 75 (6) ◽

pp. 3184-3186 ◽

Cited By ~ 12

Author(s):

Jin Jang ◽

Sung Chul Kim ◽

Kyu Chang Park ◽

Sung Ki Kim

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Hydrogen Dilution

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The preparation of microcrystalline silicon (μc‐Si) thin films by remote plasma‐enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.577430 ◽

1991 ◽

Vol 9 (3) ◽

pp. 444-449 ◽

Cited By ~ 21

Author(s):

C. Wang ◽

M. J. Williams ◽

G. Lucovsky

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Remote Plasma

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Characterization of Microcrystalline Silicon Thin Film Solar Cells Prepared by High Working Pressure Plasma-enhanced Chemical Vapor Deposition

2017 IEEE 44th Photovoltaic Specialist Conference (PVSC) ◽

10.1109/pvsc.2017.8366297 ◽

2017 ◽

Author(s):

Jung-Dae Kwon ◽

Dong-Ho Kim ◽

Ji-Hoon Lee ◽

Myungkwan Song ◽

Myunghun Shin

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Thin Film Solar Cells ◽

Microcrystalline Silicon ◽

Silicon Thin Film ◽

Working Pressure ◽

High Working Pressure

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Evolution of structure in thin microcrystalline silicon films grown by electron-cyclotron resonance chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.1289783 ◽

2000 ◽

Vol 88 (7) ◽

pp. 4376 ◽

Cited By ~ 40

Author(s):

M. Birkholz ◽

B. Selle ◽

E. Conrad ◽

K. Lips ◽

W. Fuhs

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Silicon Films ◽

Microcrystalline Silicon ◽

Evolution Of Structure

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Visible photoluminescence from silicon nanoclusters embedded in silicon nitride films prepared by remote plasma-enhanced chemical vapor deposition

Physica E Low-dimensional Systems and Nanostructures ◽

10.1016/j.physe.2006.12.047 ◽

2007 ◽

Vol 38 (1-2) ◽

pp. 148-151 ◽

Cited By ~ 6

Author(s):

A. Benami ◽

G. Santana ◽

B.M. Monroy ◽

A. Ortiz ◽

J.C. Alonso ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Nanoclusters ◽

Remote Plasma ◽

Visible Photoluminescence ◽

Silicon Nitride Films

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Effect of carrier concentration on the properties of irradiation‐induced defects inp‐type indium phosphide grown by metalorganic chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.351386 ◽

1992 ◽

Vol 71 (9) ◽

pp. 4201-4207 ◽

Cited By ~ 11

Author(s):

S. R. Messenger ◽

R. J. Walters ◽

G. P. Summers

Keyword(s):

Chemical Vapor Deposition ◽

Indium Phosphide ◽

Carrier Concentration ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Induced Defects ◽

Irradiation Induced Defects ◽

Metalorganic Chemical

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Summary Abstract: Comparative study of polycrystalline silicon thin films deposited by very low pressure chemical vapor deposition with and without plasma enhancement

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.574482 ◽

1987 ◽

Vol 5 (4) ◽

pp. 1903-1904 ◽

Cited By ~ 1

Author(s):

J.‐J. J. Hajjar ◽

R. Reif ◽

D. Adler

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Comparative Study ◽

Vapor Deposition ◽

Polycrystalline Silicon ◽

Chemical Vapor ◽

Low Pressure ◽

Silicon Thin Films ◽

Pressure Chemical ◽

Plasma Enhancement

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Characteristics of an indium antimonide metal-insulator-semiconductor structure prepared by remote plasma enhanced chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.365697 ◽

1997 ◽

Vol 82 (8) ◽

pp. 3917-3921 ◽

Cited By ~ 5

Author(s):

Jae-Gon Lee ◽

Sie-Young Choi ◽

Sang-Jun Park

Keyword(s):

Chemical Vapor Deposition ◽

Indium Antimonide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Semiconductor Structure ◽

Remote Plasma ◽

Metal Insulator ◽

Metal Insulator Semiconductor

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