The preparation of microcrystalline silicon (μc‐Si) thin films by remote plasma‐enhanced chemical vapor deposition

C. Wang; M. J. Williams; G. Lucovsky

doi:10.1116/1.577430

The preparation of microcrystalline silicon (μc‐Si) thin films by remote plasma‐enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.577430 ◽

1991 ◽

Vol 9 (3) ◽

pp. 444-449 ◽

Cited By ~ 21

Author(s):

C. Wang ◽

M. J. Williams ◽

G. Lucovsky

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Remote Plasma

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Deposition of device quality silicon dioxide thin films by remote plasma enhanced chemical vapor deposition

Vacuum ◽

10.1016/0042-207x(89)90815-4 ◽

1989 ◽

Vol 39 (10) ◽

pp. 981

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Silicon Dioxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Remote Plasma

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A comparative study of the light-induced defects in intrinsic amorphous and microcrystalline silicon deposited by remote plasma enhanced chemical vapor deposition

10.1063/1.41030 ◽

1991 ◽

Cited By ~ 8

Author(s):

M. J. Williams ◽

Cheng Wang ◽

G. Lucovsky

Keyword(s):

Chemical Vapor Deposition ◽

Comparative Study ◽

Vapor Deposition ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Remote Plasma ◽

Induced Defects

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Remote plasma chemical vapor deposition silicon oxynitride thin films: Dielectric properties

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.590013 ◽

1998 ◽

Vol 16 (3) ◽

pp. 1087 ◽

Cited By ~ 3

Author(s):

M. Hernández Vélez

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Dielectric Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Silicon Oxynitride ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Atomic structure in SiO2 thin films deposited by remote plasma‐enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.576242 ◽

1989 ◽

Vol 7 (3) ◽

pp. 1136-1144 ◽

Cited By ~ 53

Author(s):

G. Lucovsky ◽

J. T. Fitch ◽

D. V. Tsu ◽

S. S. Kim

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Atomic Structure ◽

Vapor Deposition ◽

Chemical Vapor ◽

Remote Plasma

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Structure of amorphous and microcrystalline silicon thin films prepared at various gas pressures and gas flow rates by hot-wire chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2005.07.134 ◽

2006 ◽

Vol 501 (1-2) ◽

pp. 102-106 ◽

Cited By ~ 9

Author(s):

T. Daimaru ◽

A. Tabata ◽

T. Mizutani

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Gas Flow ◽

Chemical Vapor ◽

Hot Wire ◽

Microcrystalline Silicon ◽

Flow Rates ◽

Silicon Thin Films ◽

Gas Pressures

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Deposition of SiO2 Thin Films by Remote Plasma Enhanced Chemical Vapor Deposition (Remote PECVD)

The Physics and Chemistry of SiO2 and the Si-SiO2 Interface ◽

10.1007/978-1-4899-0774-5_13 ◽

1988 ◽

pp. 119-127 ◽

Cited By ~ 1

Author(s):

D. V. Tsu ◽

S. S. Kim ◽

G. Lucovsky

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Remote Plasma

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Composition, structural, and electrical properties of fluorinated silicon–nitride thin films grown by remote plasma-enhanced chemical-vapor deposition from SiF[sub 4]/NH[sub 3] mixtures

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1699335 ◽

2004 ◽

Vol 22 (3) ◽

pp. 570 ◽

Cited By ~ 6

Author(s):

J. Fandiño ◽

A. Ortiz ◽

L. Rodrı́guez-Fernandez ◽

J. C. Alonso

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Electrical Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Remote Plasma ◽

Structural And Electrical Properties

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ChemInform Abstract: Preparation of Device-Quality SiO2 Thin Films by Remote Plasma- Enhanced Chemical Vapor Deposition (PECVD): Applications in Metal- Oxide-Semiconductor (MOS) Devices

ChemInform ◽

10.1002/chin.199636322 ◽

2010 ◽

Vol 27 (36) ◽

pp. no-no

Author(s):

G. LUCOVSKY

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Metal Oxide ◽

Vapor Deposition ◽

Chemical Vapor ◽

Metal Oxide Semiconductor ◽

Oxide Semiconductor ◽

Remote Plasma ◽

Mos Devices

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Microstructures of microcrystalline silicon thin films prepared by hot wire chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(99)00757-9 ◽

2000 ◽

Vol 360 (1-2) ◽

pp. 205-212 ◽

Cited By ~ 15

Author(s):

M. Zhu ◽

X. Guo ◽

G. Chen ◽

H. Han ◽

M. He ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Hot Wire ◽

Microcrystalline Silicon ◽

Silicon Thin Films

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Influence of substrate on the growth of microcrystalline silicon thin films deposited by plasma enhanced chemical vapor deposition

Materials Science in Semiconductor Processing ◽

10.1016/j.mssp.2012.02.008 ◽

2012 ◽

Vol 15 (4) ◽

pp. 412-420 ◽

Cited By ~ 9

Author(s):

Limin Qi ◽

Zhijuan Hu ◽

Wang Li ◽

Xiaomei Qin ◽

Guoping Du ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Silicon Thin Films ◽

Influence Of Substrate

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