Transparent and conductive impurity‐doped GaN thin films prepared by an electron cyclotron resonance plasma metalorganic chemical vapor deposition method

Hirotoshi Sato; Tadatsugu Minami; Eiji Yamada; Makoto Ishii; Shinzo Takata

doi:10.1063/1.356421

Transparent and conductive impurity‐doped GaN thin films prepared by an electron cyclotron resonance plasma metalorganic chemical vapor deposition method

Journal of Applied Physics ◽

10.1063/1.356421 ◽

1994 ◽

Vol 75 (3) ◽

pp. 1405-1409 ◽

Cited By ~ 23

Author(s):

Hirotoshi Sato ◽

Tadatsugu Minami ◽

Eiji Yamada ◽

Makoto Ishii ◽

Shinzo Takata

Keyword(s):

Vapor Deposition ◽

Cyclotron Resonance ◽

Metalorganic Chemical Vapor Deposition ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Impurity Doped ◽

Resonance Plasma ◽

Metalorganic Chemical

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Transparent and conductive GaN thin films prepared by an electron cyclotron resonance plasma metalorganic chemical vapor deposition method

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578566 ◽

1993 ◽

Vol 11 (4) ◽

pp. 1422-1425 ◽

Cited By ~ 6

Author(s):

H. Sato ◽

T. Minami ◽

E. Yamada ◽

S. Takata ◽

M. Ishii

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Metalorganic Chemical Vapor Deposition ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Resonance Plasma ◽

Metalorganic Chemical

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Low Temperature Chemical Vapor Deposition Method Utilizing an Electron Cyclotron Resonance Plasma

Japanese Journal of Applied Physics ◽

10.1143/jjap.22.l210 ◽

1983 ◽

Vol 22 (Part 2, No. 4) ◽

pp. L210-L212 ◽

Cited By ~ 289

Author(s):

Seitaro Matsuo ◽

Mikiho Kiuchi

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Resonance Plasma

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Electron Cyclotron Resonance Plasma-Enhanced Metalorganic Chemical Vapor Deposition of Tantalum Oxide Thin Films on Silicon near Room Temperature

Journal of the American Ceramic Society ◽

10.1111/j.1151-2916.1995.tb08855.x ◽

1995 ◽

Vol 78 (6) ◽

pp. 1585-1592 ◽

Cited By ~ 12

Author(s):

Atsushi Nagahori ◽

Rishi Raj

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Electron Cyclotron Resonance ◽

Tantalum Oxide ◽

Chemical Vapor ◽

Resonance Plasma ◽

Metalorganic Chemical

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Low-Temperature Preparation of SrBi2Ta2O9Thin Films by Electron Cyclotron Resonance Plasma-Enhanced Metalorganic Chemical Vapor Deposition and Their Electrical Properties

Japanese Journal of Applied Physics ◽

10.1143/jjap.39.5496 ◽

2000 ◽

Vol 39 (Part 1, No. 9B) ◽

pp. 5496-5500 ◽

Cited By ~ 7

Author(s):

Norimasa Nukaga ◽

Masatoshi Mitsuya ◽

Hiroshi Funakubo

Keyword(s):

Electrical Properties ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Metalorganic Chemical Vapor Deposition ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Low Temperature Preparation ◽

Resonance Plasma ◽

Metalorganic Chemical ◽

Temperature Preparation

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Electron cyclotron resonance plasma enhanced metalorganic chemical vapor deposition system with monitoringin situfor epitaxial growth of group-III nitrides

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1641055 ◽

2004 ◽

Vol 22 (2) ◽

pp. 302-308 ◽

Cited By ~ 15

Author(s):

Yin Xu ◽

Biao Gu ◽

Fu-Wen Qin

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Metalorganic Chemical Vapor Deposition ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Group Iii Nitrides ◽

Group Iii ◽

Resonance Plasma ◽

Metalorganic Chemical

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Silicon nitride thin films prepared by the electron cyclotron resonance plasma chemical vapor deposition method

Journal of Applied Physics ◽

10.1063/1.344258 ◽

1989 ◽

Vol 66 (6) ◽

pp. 2475-2480 ◽

Cited By ~ 80

Author(s):

Y. Manabe ◽

T. Mitsuyu

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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Electron cyclotron resonance plasma source for metalorganic chemical vapor deposition of silicon oxide films

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578872 ◽

1994 ◽

Vol 12 (2) ◽

pp. 300-307 ◽

Cited By ~ 11

Author(s):

O. A. Popov ◽

S. Y. Shapoval ◽

M. D. Yoder ◽

A. A. Chumakov

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Metalorganic Chemical Vapor Deposition ◽

Silicon Oxide ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Plasma Source ◽

Resonance Plasma ◽

Metalorganic Chemical

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Very‐low‐pressure deposition by electron cyclotron resonance plasma chemical vapor deposition method

Journal of Applied Physics ◽

10.1063/1.346082 ◽

1990 ◽

Vol 67 (10) ◽

pp. 6281-6285 ◽

Cited By ~ 9

Author(s):

Koun Shirai ◽

Shun‐ichi Gonda

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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Microstructure and Optical Properties of Al[sub x]Ga[sub 1−x]N∕GaN Heterostructure Thin Films Grown on Si(111) Substrate by Plasma Assisted Metalorganic Chemical Vapor Deposition Method

10.1063/1.2906048 ◽

2008 ◽

Author(s):

H. Sutanto ◽

A. Subagio ◽

E. Supriyanto ◽

P. Arifin ◽

M. Budiman ◽

...

Keyword(s):

Thin Films ◽

Optical Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Gan Heterostructure ◽

Metalorganic Chemical

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The deposition behavior of SiO[sub 2]–TiO[sub 2] thin film by metalorganic chemical vapor deposition method

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1287154 ◽

2000 ◽

Vol 18 (5) ◽

pp. 2384 ◽

Cited By ~ 16

Author(s):

Si-Moo Lee ◽

Jeong-Hoon Park ◽

Kug-Sun Hong ◽

Woon-Jo Cho ◽

Dong-Lae Kim

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Deposition Behavior ◽

Metalorganic Chemical

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