Electron cyclotron resonance plasma enhanced metalorganic chemical vapor deposition system with monitoringin situfor epitaxial growth of group-III nitrides

Yin Xu; Biao Gu; Fu-Wen Qin

doi:10.1116/1.1641055

Electron cyclotron resonance plasma enhanced metalorganic chemical vapor deposition system with monitoringin situfor epitaxial growth of group-III nitrides

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1641055 ◽

2004 ◽

Vol 22 (2) ◽

pp. 302-308 ◽

Cited By ~ 15

Author(s):

Yin Xu ◽

Biao Gu ◽

Fu-Wen Qin

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Metalorganic Chemical Vapor Deposition ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Group Iii Nitrides ◽

Group Iii ◽

Resonance Plasma ◽

Metalorganic Chemical

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Electron cyclotron resonance plasma source for metalorganic chemical vapor deposition of silicon oxide films

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578872 ◽

1994 ◽

Vol 12 (2) ◽

pp. 300-307 ◽

Cited By ~ 11

Author(s):

O. A. Popov ◽

S. Y. Shapoval ◽

M. D. Yoder ◽

A. A. Chumakov

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Metalorganic Chemical Vapor Deposition ◽

Silicon Oxide ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Plasma Source ◽

Resonance Plasma ◽

Metalorganic Chemical

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Electron Cyclotron Resonance Plasma-Enhanced Metalorganic Chemical Vapor Deposition of Tantalum Oxide Thin Films on Silicon near Room Temperature

Journal of the American Ceramic Society ◽

10.1111/j.1151-2916.1995.tb08855.x ◽

1995 ◽

Vol 78 (6) ◽

pp. 1585-1592 ◽

Cited By ~ 12

Author(s):

Atsushi Nagahori ◽

Rishi Raj

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Electron Cyclotron Resonance ◽

Tantalum Oxide ◽

Chemical Vapor ◽

Resonance Plasma ◽

Metalorganic Chemical

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Transparent and conductive impurity‐doped GaN thin films prepared by an electron cyclotron resonance plasma metalorganic chemical vapor deposition method

Journal of Applied Physics ◽

10.1063/1.356421 ◽

1994 ◽

Vol 75 (3) ◽

pp. 1405-1409 ◽

Cited By ~ 23

Author(s):

Hirotoshi Sato ◽

Tadatsugu Minami ◽

Eiji Yamada ◽

Makoto Ishii ◽

Shinzo Takata

Keyword(s):

Vapor Deposition ◽

Cyclotron Resonance ◽

Metalorganic Chemical Vapor Deposition ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Impurity Doped ◽

Resonance Plasma ◽

Metalorganic Chemical

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Low-Temperature Preparation of SrBi2Ta2O9Thin Films by Electron Cyclotron Resonance Plasma-Enhanced Metalorganic Chemical Vapor Deposition and Their Electrical Properties

Japanese Journal of Applied Physics ◽

10.1143/jjap.39.5496 ◽

2000 ◽

Vol 39 (Part 1, No. 9B) ◽

pp. 5496-5500 ◽

Cited By ~ 7

Author(s):

Norimasa Nukaga ◽

Masatoshi Mitsuya ◽

Hiroshi Funakubo

Keyword(s):

Electrical Properties ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Metalorganic Chemical Vapor Deposition ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Low Temperature Preparation ◽

Resonance Plasma ◽

Metalorganic Chemical ◽

Temperature Preparation

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Transparent and conductive GaN thin films prepared by an electron cyclotron resonance plasma metalorganic chemical vapor deposition method

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578566 ◽

1993 ◽

Vol 11 (4) ◽

pp. 1422-1425 ◽

Cited By ~ 6

Author(s):

H. Sato ◽

T. Minami ◽

E. Yamada ◽

S. Takata ◽

M. Ishii

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Metalorganic Chemical Vapor Deposition ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Resonance Plasma ◽

Metalorganic Chemical

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Metalorganic chemical vapor deposition of group III nitrides—a discussion of critical issues

Journal of Crystal Growth ◽

10.1016/s0022-0248(02)01867-5 ◽

2003 ◽

Vol 248 ◽

pp. 479-486 ◽

Cited By ~ 58

Author(s):

Stacia Keller ◽

Steven P. DenBaars

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Group Iii Nitrides ◽

Group Iii ◽

Critical Issues ◽

Metalorganic Chemical

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Chapter 2 Metalorganic Chemical Vapor Deposition (MOCVD) of Group III Nitrides

Semiconductors and Semimetals - Gallium Nitride (GaN) I ◽

10.1016/s0080-8784(08)63083-5 ◽

1997 ◽

pp. 11-37 ◽

Cited By ~ 9

Author(s):

S.P. DenBaars ◽

S. Keller

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Group Iii Nitrides ◽

Group Iii ◽

Metalorganic Chemical

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Effect of nitrogen flow on the properties of carbon nitride films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Vacuum ◽

10.1016/j.vacuum.2021.110223 ◽

2021 ◽

pp. 110223

Author(s):

Sixu Lin ◽

Dong Xie ◽

Yongliang Tang ◽

Yiwen Wang ◽

Fengjuan Jing ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Carbon Nitride ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Nitrogen Flow ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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c-Axis oriented AlN films prepared on diamond film substrate by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/s0022-0248(01)01810-3 ◽

2002 ◽

Vol 235 (1-4) ◽

pp. 333-339 ◽

Cited By ~ 7

Author(s):

H Gong ◽

X Jiang

Keyword(s):

Chemical Vapor Deposition ◽

Diamond Film ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Film Substrate ◽

Resonance Plasma

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In situ investigation of the passivation of Si and Ge by electron cyclotron resonance plasma enhanced chemical vapor deposition of SiO2

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.589211 ◽

1996 ◽

Vol 14 (3) ◽

pp. 1687 ◽

Cited By ~ 9

Author(s):

Y. Wang

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

In Situ Investigation ◽

Resonance Plasma

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