The deposition behavior of SiO[sub 2]–TiO[sub 2] thin film by metalorganic chemical vapor deposition method
2000 ◽
Vol 18
(5)
◽
pp. 2384
◽
2008 ◽
2004 ◽
Vol 22
(2)
◽
pp. 624
◽
1994 ◽
Vol 33
(Part 1, No. 7A)
◽
pp. 4066-4069
◽
2008 ◽
1990 ◽
Vol 29
(Part 2, No. 10)
◽
pp. L1874-L1876
◽