Electron cyclotron resonance plasma source for metalorganic chemical vapor deposition of silicon oxide films

O. A. Popov; S. Y. Shapoval; M. D. Yoder; A. A. Chumakov

doi:10.1116/1.578872

Electron cyclotron resonance plasma source for metalorganic chemical vapor deposition of silicon oxide films

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578872 ◽

1994 ◽

Vol 12 (2) ◽

pp. 300-307 ◽

Cited By ~ 11

Author(s):

O. A. Popov ◽

S. Y. Shapoval ◽

M. D. Yoder ◽

A. A. Chumakov

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Metalorganic Chemical Vapor Deposition ◽

Silicon Oxide ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Plasma Source ◽

Resonance Plasma ◽

Metalorganic Chemical

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Electron cyclotron resonance plasma enhanced metalorganic chemical vapor deposition system with monitoringin situfor epitaxial growth of group-III nitrides

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1641055 ◽

2004 ◽

Vol 22 (2) ◽

pp. 302-308 ◽

Cited By ~ 15

Author(s):

Yin Xu ◽

Biao Gu ◽

Fu-Wen Qin

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Metalorganic Chemical Vapor Deposition ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Group Iii Nitrides ◽

Group Iii ◽

Resonance Plasma ◽

Metalorganic Chemical

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Electron Cyclotron Resonance Plasma-Enhanced Metalorganic Chemical Vapor Deposition of Tantalum Oxide Thin Films on Silicon near Room Temperature

Journal of the American Ceramic Society ◽

10.1111/j.1151-2916.1995.tb08855.x ◽

1995 ◽

Vol 78 (6) ◽

pp. 1585-1592 ◽

Cited By ~ 12

Author(s):

Atsushi Nagahori ◽

Rishi Raj

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Room Temperature ◽

Metalorganic Chemical Vapor Deposition ◽

Electron Cyclotron Resonance ◽

Tantalum Oxide ◽

Chemical Vapor ◽

Resonance Plasma ◽

Metalorganic Chemical

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Transparent and conductive impurity‐doped GaN thin films prepared by an electron cyclotron resonance plasma metalorganic chemical vapor deposition method

Journal of Applied Physics ◽

10.1063/1.356421 ◽

1994 ◽

Vol 75 (3) ◽

pp. 1405-1409 ◽

Cited By ~ 23

Author(s):

Hirotoshi Sato ◽

Tadatsugu Minami ◽

Eiji Yamada ◽

Makoto Ishii ◽

Shinzo Takata

Keyword(s):

Vapor Deposition ◽

Cyclotron Resonance ◽

Metalorganic Chemical Vapor Deposition ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Impurity Doped ◽

Resonance Plasma ◽

Metalorganic Chemical

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Water absorption characteristics of fluorinated silicon oxide films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition using SiH4, SiF4 and O2

Thin Solid Films ◽

10.1016/s0040-6090(00)01206-2 ◽

2000 ◽

Vol 376 (1-2) ◽

pp. 26-31 ◽

Cited By ~ 15

Author(s):

Kyung-Mun Byun ◽

Won-Jong Lee

Keyword(s):

Chemical Vapor Deposition ◽

Water Absorption ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Silicon Oxide ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Fluorinated Silicon Oxide ◽

Resonance Plasma ◽

Absorption Characteristics

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Low-Temperature Preparation of SrBi2Ta2O9Thin Films by Electron Cyclotron Resonance Plasma-Enhanced Metalorganic Chemical Vapor Deposition and Their Electrical Properties

Japanese Journal of Applied Physics ◽

10.1143/jjap.39.5496 ◽

2000 ◽

Vol 39 (Part 1, No. 9B) ◽

pp. 5496-5500 ◽

Cited By ~ 7

Author(s):

Norimasa Nukaga ◽

Masatoshi Mitsuya ◽

Hiroshi Funakubo

Keyword(s):

Electrical Properties ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Metalorganic Chemical Vapor Deposition ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Low Temperature Preparation ◽

Resonance Plasma ◽

Metalorganic Chemical ◽

Temperature Preparation

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Transparent and conductive GaN thin films prepared by an electron cyclotron resonance plasma metalorganic chemical vapor deposition method

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.578566 ◽

1993 ◽

Vol 11 (4) ◽

pp. 1422-1425 ◽

Cited By ~ 6

Author(s):

H. Sato ◽

T. Minami ◽

E. Yamada ◽

S. Takata ◽

M. Ishii

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Metalorganic Chemical Vapor Deposition ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Resonance Plasma ◽

Metalorganic Chemical

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Effect of N2O plasma treatment on the stabilization of water absorption in fluorinated silicon-oxide thin films fabricated by electron-cyclotron-resonance plasma-enhanced chemical-vapor deposition

Applied Physics Letters ◽

10.1063/1.1458528 ◽

2002 ◽

Vol 80 (10) ◽

pp. 1728-1730 ◽

Cited By ~ 4

Author(s):

S. P. Kim ◽

S. K. Choi ◽

Youngsoo Park ◽

Ilsub Chung

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Water Absorption ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Silicon Oxide ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Fluorinated Silicon Oxide ◽

Resonance Plasma

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Properties of silicon oxide deposited by electron-cyclotron-resonance plasma-enhanced chemical vapor deposition

10.1117/12.156526 ◽

1993 ◽

Cited By ~ 1

Author(s):

Burt W. Fowler ◽

David R. Stark ◽

J. Xie ◽

C. McDonald ◽

Ronald A. Carpio ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Silicon Oxide ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Effect of water absorption on the residual stress in fluorinated silicon-oxide thin films fabricated by electron-cyclotron-resonance plasma-enhanced chemical-vapor deposition

Applied Physics Letters ◽

10.1063/1.1383278 ◽

2001 ◽

Vol 79 (2) ◽

pp. 185-187 ◽

Cited By ~ 11

Author(s):

S. P. Kim ◽

S. K. Choi ◽

Youngsoo Park ◽

Ilsub Chung

Keyword(s):

Thin Films ◽

Residual Stress ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Silicon Oxide ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Fluorinated Silicon Oxide ◽

Resonance Plasma

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Effect of nitrogen flow on the properties of carbon nitride films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Vacuum ◽

10.1016/j.vacuum.2021.110223 ◽

2021 ◽

pp. 110223

Author(s):

Sixu Lin ◽

Dong Xie ◽

Yongliang Tang ◽

Yiwen Wang ◽

Fengjuan Jing ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Carbon Nitride ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Nitrogen Flow ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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