Microstructure and Optical Properties of Al[sub x]Ga[sub 1−x]N∕GaN Heterostructure Thin Films Grown on Si(111) Substrate by Plasma Assisted Metalorganic Chemical Vapor Deposition Method
2008 ◽
1990 ◽
Vol 29
(Part 2, No. 10)
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pp. L1874-L1876
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2014 ◽
Vol 53
(5S1)
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pp. 05FB17
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2000 ◽
Vol 18
(5)
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pp. 2384
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2005 ◽
Vol 23
(4)
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pp. 875-879
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2018 ◽
Vol 458
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pp. 972-977
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