Very‐low‐pressure deposition by electron cyclotron resonance plasma chemical vapor deposition method

Koun Shirai; Shun‐ichi Gonda

doi:10.1063/1.346082

Very‐low‐pressure deposition by electron cyclotron resonance plasma chemical vapor deposition method

Journal of Applied Physics ◽

10.1063/1.346082 ◽

1990 ◽

Vol 67 (10) ◽

pp. 6281-6285 ◽

Cited By ~ 9

Author(s):

Koun Shirai ◽

Shun‐ichi Gonda

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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Silicon nitride thin films prepared by the electron cyclotron resonance plasma chemical vapor deposition method

Journal of Applied Physics ◽

10.1063/1.344258 ◽

1989 ◽

Vol 66 (6) ◽

pp. 2475-2480 ◽

Cited By ~ 80

Author(s):

Y. Manabe ◽

T. Mitsuyu

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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Radical Fluxes in Electron Cyclotron Resonance Plasma Chemical Vapor Deposition of Amorphous Silicon

Japanese Journal of Applied Physics ◽

10.1143/jjap.34.5965 ◽

1995 ◽

Vol 34 (Part 1, No. 11) ◽

pp. 5965-5970 ◽

Cited By ~ 3

Author(s):

Mei Zhang ◽

Yoshikazu Nakayama

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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Behavior of charged particles in an electron cyclotron resonance plasma chemical vapor deposition reactor

Applied Physics Letters ◽

10.1063/1.103892 ◽

1990 ◽

Vol 57 (22) ◽

pp. 2297-2299 ◽

Cited By ~ 4

Author(s):

Yoshikazu Nakayama ◽

Mitsuru Kondoh ◽

Kohji Hitsuishi ◽

Mei Zhang ◽

Takao Kawamura

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Charged Particles ◽

Chemical Vapor ◽

Plasma Chemical ◽

Chemical Vapor Deposition Reactor ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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Low‐Temperature Si Epitaxial Growth by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.2069532 ◽

1992 ◽

Vol 139 (7) ◽

pp. 1983-1988 ◽

Cited By ~ 3

Author(s):

Naoki Kasai ◽

Nobuhiro Endo

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Epitaxial Growth ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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Study on the electron cyclotron resonance plasma chemical vapor deposition of carbon nanotubes

Materials Science and Engineering B ◽

10.1016/j.mseb.2007.03.008 ◽

2007 ◽

Vol 140 (1-2) ◽

pp. 44-47

Author(s):

Zhi Wang ◽

Dechun Ba ◽

Peijiang Cao ◽

ChunhongYu ◽

Ji Liang

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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Low Temperature Chemical Vapor Deposition Method Utilizing an Electron Cyclotron Resonance Plasma

Japanese Journal of Applied Physics ◽

10.1143/jjap.22.l210 ◽

1983 ◽

Vol 22 (Part 2, No. 4) ◽

pp. L210-L212 ◽

Cited By ~ 289

Author(s):

Seitaro Matsuo ◽

Mikiho Kiuchi

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Resonance Plasma

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A Study on the Relation between Film Quality and Deposition Rate for Amorphous Silicon Films Grown by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition Using H 2/SiH 4

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.l986 ◽

1997 ◽

Vol 36 (Part 2, No. 8A) ◽

pp. L986-L988

Author(s):

Moonsang Kang ◽

Jaeyeong Kim ◽

Taehoon Lim ◽

Inhwan Oh ◽

Bupju Jeon ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Deposition Rate ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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Electron cyclotron resonance plasma chemical vapor deposition for rugate film manufacturing

10.1117/12.192121 ◽

1994 ◽

Cited By ~ 1

Author(s):

Pavel V. Bulkin ◽

Pieter L. Swart ◽

Beatrys M. Lacquet

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Chemical ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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Epitaxial growth of silicon at low temperature by ultrahigh vacuum electron cyclotron resonance plasma chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.342429 ◽

1988 ◽

Vol 64 (10) ◽

pp. 5183-5188 ◽

Cited By ~ 31

Author(s):

I. Nagai ◽

T. Takahagi ◽

A. Ishitani ◽

H. Kuroda ◽

M. Yoshikawa

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Epitaxial Growth ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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Characterization of hydrogenated amorphous boron films prepared by electron cyclotron resonance plasma chemical vapor deposition method

Journal of Applied Physics ◽

10.1063/1.345145 ◽

1990 ◽

Vol 67 (10) ◽

pp. 6286-6291 ◽

Cited By ~ 32

Author(s):

Koun Shirai ◽

Shun‐ichi Gonda

Keyword(s):

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Hydrogenated Amorphous ◽

Resonance Plasma

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