Effects of hydrogen and nitrogen ion bombardments on soft magnetism of iron films during double‐ion‐beam sputtering

1988 ◽  
Vol 63 (8) ◽  
pp. 4309-4311 ◽  
Author(s):  
M. Nagakubo ◽  
T. Yamamoto ◽  
M. Naoe
Keyword(s):  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Iron Films ◽  
Beam Sputtering ◽  
Nitrogen Ion ◽  
Soft Magnetism

scholarly journals SOFT MAGNETISM AND MICRO-STRUCTURE OF IRON FILMS BY ION BEAM SPUTTERING

1989 ◽  
Vol 13 (S_1_PMRC_89) ◽  
pp. S1_323-328
Author(s):  
Masao NAGAKUBO ◽  
Tetsuya YAMAMOTO ◽  
Masahiko NAOE
Keyword(s):  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Micro Structure ◽  
Iron Films ◽  
Beam Sputtering ◽  
Soft Magnetism

Soft Magnetism and Morphology of Fe Films by Dual Ion Beam Sputtering

1988 ◽  
Vol 128 ◽  
Author(s):  
M. Nagakubo ◽  
T. Yamamoto ◽  
M. Naoe
Keyword(s):  
Kinetic Energy ◽  
Ion Beam ◽  
Film Surface ◽  
Columnar Structure ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Argon Ions ◽  
The Difference ◽  
Dual Ion Beam Sputtering ◽  
Soft Magnetism

ABSTRACTFe films have been deposited by using dual ion beam sputtering apparatus under various conditions, and the dependence of their magnetic properties and morphology on preparation parameters such as film thickness, δt, and argon gas pressure, PAr, have been investigated in detail. The saturation magnetiza ion 4πMs of the specimen films did not change remarkably with 6t in the range of 50 ∼1000nm. However, with decrease of 6t below 50 nm, 4πMs decreased to less than 20 kG and coercivity Hc increased to more than 16 Oe. As PAr increased from 0.5 to 1.6 mTorr without ion bombardment, 4πMs decreased to less than 20 kG and Hc increased to about 20 Oe. The SEM micrographs of these films deposited at higher PAr showed the columnar structure. On the other hand, the films deposited at Yower PAr and ones bombarded by argon ions with proper kinetic energy during deposition did not present any texture and exhibited better soft magnetism. Such a morphology may be attributed to the difference in arrival energy of sputtered Fe particles to film surface and related closely to soft magnetism. It has been found that the dual ion beam sputtering method can control 4πMs and Hc with changing PAr and so prepare Fe films with superior soft magnetism by adjusting the kinetic energy of bombarding argon ions at lower PAr.

Effect of Bombardment of High Energy Ions onto Growing Surface on Structure and Properties of Sputtered Magnetic Films

1985 ◽  
Vol 58 ◽  
Author(s):  
N. Terada ◽  
M. Naoe
Keyword(s):  
Ion Beam ◽  
Magnetic Thin Films ◽  
Magnetic Films ◽  
High Energy ◽  
Structure And Properties ◽  
Ion Beam Sputtering ◽  
Iron Films ◽  
Macro Scale ◽  
Beam Sputtering ◽  
High Energy Ions

Magnetic thin films (Co-Ta, Co-Zr and pure iron films) have been deposited by means of dual ion beam sputtering and the effect of bombardment of high energy ions onto growing surface on their structure and properties has been investigated. The bombardment of argon ions with proper kinetic energy has the effects as follows;I. suppression of growth of crystallites, II. improvement of structural ordering in micro-scale and III. improvement of structural uniformity in macro-scale. Therefore, the films deposited with the proper bombardment are composed of fine crystallites with good atomic ordering. This causes an increase of 4лMs and reduction of Hc of the films;Co-Zr:4лMs=16 kG, Hc<0.6 Oe, Co-Ta:4лMs=15 kG,Hc<0.3 Oe and iron films:4лMs=21 kG,Hc=l Oe.

Nitrogen‐ion irradiation during the deposition of C1−xNx thin films by ion beam sputtering technique

1996 ◽  
Vol 14 (3) ◽  
pp. 777-780 ◽  
Author(s):  
Satoshi Kobayashi ◽  
Keiko Miyazaki ◽  
Shinji Nozaki ◽  
Hiroshi Morisaki ◽  
Shigeo Fukui ◽  
...  
Keyword(s):  
Thin Films ◽  
Ion Irradiation ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Nitrogen Ion

Preparation of SiCN crystals using microwave plasma CVD assisted by pulsed nitrogen ion beam sputtering

Carbon ◽  
2010 ◽  
Vol 48 (7) ◽  
pp. 2124-2125
Author(s):  
Jun Wan ◽  
Zhi-bin Ma ◽  
Hong Cao ◽  
Zhen-hui Wu ◽  
Jian-hua Wang
Keyword(s):  
Microwave Plasma ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Plasma Cvd ◽  
Microwave Plasma Cvd ◽  
Beam Sputtering ◽  
Nitrogen Ion

Effects of Nitrogen Ion Energy on the Growth Mode of WN Films Deposited by Reactive Ion Beam Sputtering

1992 ◽  
Vol 268 ◽  
Author(s):  
A.H. Benhocine ◽  
F. Meyer ◽  
M. Eizenberg ◽  
D. Bouchier ◽  
S. Kianfar
Keyword(s):  
Ion Beam ◽  
Growth Mode ◽  
Sticking Coefficient ◽  
Ion Beam Sputtering ◽  
Ion Energy ◽  
Si Substrates ◽  
Beam Sputtering ◽  
Electron Spectrometry ◽  
Nitrogen Ion

ABSTRACTWN films were deposited on clean Si substrates by Reactive Ion Beam Sputtering in a UHV system. The growth mode of the films as a function of the nitrogen ion energy was investigated by in situ Auger Electron Spectrometry. The energy of the incident ions was varied from 250 eV to 3 keV. We observed a significant nitridation of the silicon at the very beginning of the deposition. This nitridation is more pronounced for the lower energy and is more reduced for 2 keV-ions. It seems to follow the trend of the film composition: 250 eV-ions and 2 keV-ions result in N-rich films (N/W≈1) and W-rich films (N/W≈0.5), respectively. All these results are discussed in terms of sputtering yield, backscattering and sticking coefficient and are explained by taking into account: first, the interaction between the incident ions and the target, and second, the interaction between the species emitted by the target and the growing film.

Dual Ion Beam Sputtering for Chromium Nitride as an Alternative to Electroplated Hexavalent Chromium

2005 ◽  
Vol 486-487 ◽  
pp. 301-304
Author(s):  
Kyoung Chul Shin ◽  
Jong Min Lim ◽  
Chong Mu Lee
Keyword(s):  
Corrosion Resistance ◽  
Deposition Rate ◽  
Ion Beam ◽  
Rf Power ◽  
Ion Beam Sputtering ◽  
Chromium Plating ◽  
Beam Sputtering ◽  
Nitrogen Ion ◽  
Dual Ion Beam Sputtering ◽  
Argon Ion

The hexavalent chromium used in chromium plating is so toxic that it is very hazardous to human body and even carcinogenic. Therefore, it is indispensable to develop an alternative deposition technique. To explore the feasibility of sputtering as an alternative technique for chromium plating, we investigated the dependences of the deposition rate, the phases, the hardness, the surface roughness and the corrosion-resistance of CrNx deposited on the high speed steel substrate by using a dual ion beam sputtering system on the rf-powers. The deposition rate of CrNx depends more strongly upon the rf-power for argon ion beam than that of the nitrogen ion beam. The hardness of the CrNx film can be maximized by optimizing the rf-power, so that the volume percent of the Cr2N phase in the film is highest. Amorphous films are obtained when the rf-power for nitrogen ion beam is much higher than that for argon ion beam. The CrNx film deposited by using the sputtering technique under the optimal condition provides corrosion-resistance comparable to that of the electroplated chromium.

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