Magnetic properties and corrosion resistance of single-crystal iron films prepared by dual-ion-beam sputtering

1999 ◽  
Vol 35 (5) ◽  
pp. 3439-3441 ◽  
Author(s):  
K. Nishimura ◽  
K. Horii ◽  
T. Fujii ◽  
M. Inoue
Keyword(s):  
Magnetic Properties ◽  
Corrosion Resistance ◽  
Single Crystal ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Iron Films ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering

Magnetic properties of multilayered Fe-C film formed by dual ion beam sputtering

1987 ◽  
Vol 23 (5) ◽  
pp. 2746-2748 ◽  
Author(s):  
T. Kobayashi ◽  
R. Nakatani ◽  
S. Otomo ◽  
N. Kumasaka
Keyword(s):  
Magnetic Properties ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering

Dual Ion Beam Sputtering for Chromium Nitride as an Alternative to Electroplated Hexavalent Chromium

2005 ◽  
Vol 486-487 ◽  
pp. 301-304
Author(s):  
Kyoung Chul Shin ◽  
Jong Min Lim ◽  
Chong Mu Lee
Keyword(s):  
Corrosion Resistance ◽  
Deposition Rate ◽  
Ion Beam ◽  
Rf Power ◽  
Ion Beam Sputtering ◽  
Chromium Plating ◽  
Beam Sputtering ◽  
Nitrogen Ion ◽  
Dual Ion Beam Sputtering ◽  
Argon Ion

The hexavalent chromium used in chromium plating is so toxic that it is very hazardous to human body and even carcinogenic. Therefore, it is indispensable to develop an alternative deposition technique. To explore the feasibility of sputtering as an alternative technique for chromium plating, we investigated the dependences of the deposition rate, the phases, the hardness, the surface roughness and the corrosion-resistance of CrNx deposited on the high speed steel substrate by using a dual ion beam sputtering system on the rf-powers. The deposition rate of CrNx depends more strongly upon the rf-power for argon ion beam than that of the nitrogen ion beam. The hardness of the CrNx film can be maximized by optimizing the rf-power, so that the volume percent of the Cr2N phase in the film is highest. Amorphous films are obtained when the rf-power for nitrogen ion beam is much higher than that for argon ion beam. The CrNx film deposited by using the sputtering technique under the optimal condition provides corrosion-resistance comparable to that of the electroplated chromium.

Structure and Magnetic Properties of Fe-N Films Prepared by Dual Ion Beam Sputtering

2001 ◽  
Vol 3 (6) ◽  
pp. 1049-1054
Author(s):  
Zhuge Lan-jian ◽  
Wu Xue-mei ◽  
Tang Nai-yun ◽  
Ye Chun-lan ◽  
Yao Wei-guo
Keyword(s):  
Magnetic Properties ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering

Preparation and Gas Addition of Soft Magnetic Pure Iron Thin Film by Dual Ion Beam Sputtering

1986 ◽  
Vol 80 ◽  
Author(s):  
M. Nagakubo ◽  
A. Kawano ◽  
M. Naoe
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Pure Iron ◽  
Ion Beam ◽  
Film Surface ◽  
Iron Film ◽  
Ion Beam Sputtering ◽  
Soft Magnetic ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering

AbstractPure iron thin films with soft magnetic properties and good chemical stabilities have been prepared by Dual Ion Beam Sputtering (DIBS). Four kinds of gas, that is, hydrogen, helium, nitrogen and argon were introduced respectively to the auxiliary ion source as the additional element in the film and also for the purpose of bombardment during deposition. The dependence of crystal structure and magnetic properties of the films on the preparation condition, especially, on the effect of various gases added in the films by ion bombardment onto the depositing film surface, has been investigated.Saturation magnetization 4πMs of iron film including gas atoms is usually smaller than that of bulk iron which has 4πMs of 21.5kG. For example, 4πMs of the film prepared by conventional planer magnetron sputtering remains about 15kG. Such a remarkable difference in 4πMs may be primarily attributed to the considerable amount of argon atoms included in the film due to argon pressure as high as 10mTorr. It may be also caused by high energy particles bombarding onto the iron film surface during deposition. On the other hand, pure iron thin films prepared by Dual Ion Beam Sputtering can have 47Ms as high as 21.5kG, and coercive force Hc as low as about 4 Oe by controlling the ratio of sputtering iron atoms to argon gas atoms, impinging onto the substrate, and the arrival energies both of them. Magnetic properties and crystal structures of the iron thin films depend significantly on the kind of added gas. In this study, it has been found that bombardment and addition of adequate gas atoms with proper energy results in an improvement of atomic ordering and microscopic uniformity in the films.

Nanostructure and magnetic properties of BN-encapsulated Fe(B) and Fe2N nanoparticles prepared by dual ion-beam sputtering

2003 ◽  
Vol 82 (18) ◽  
pp. 3056-3058 ◽  
Author(s):  
D. Babonneau ◽  
M. Jaouen ◽  
M.-F. Denanot ◽  
P. Guérin ◽  
F. Petroff
Keyword(s):  
Magnetic Properties ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering
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