Effects of annealing and periodic ion bombardment on the soft magnetism of FexN films by a double ion beam sputtering system

1988 ◽  
Vol 64 (10) ◽  
pp. 5449-5451 ◽  
Author(s):  
M. Naoe ◽  
M. Nagakubo ◽  
T. Yamamoto
Keyword(s):  
Ion Beam ◽  
Ion Bombardment ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Soft Magnetism ◽  
Sputtering System

Soft Magnetism and Morphology of Fe Films by Dual Ion Beam Sputtering

1988 ◽  
Vol 128 ◽  
Author(s):  
M. Nagakubo ◽  
T. Yamamoto ◽  
M. Naoe
Keyword(s):  
Kinetic Energy ◽  
Ion Beam ◽  
Film Surface ◽  
Columnar Structure ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Argon Ions ◽  
The Difference ◽  
Dual Ion Beam Sputtering ◽  
Soft Magnetism

ABSTRACTFe films have been deposited by using dual ion beam sputtering apparatus under various conditions, and the dependence of their magnetic properties and morphology on preparation parameters such as film thickness, δt, and argon gas pressure, PAr, have been investigated in detail. The saturation magnetiza ion 4πMs of the specimen films did not change remarkably with 6t in the range of 50 ∼1000nm. However, with decrease of 6t below 50 nm, 4πMs decreased to less than 20 kG and coercivity Hc increased to more than 16 Oe. As PAr increased from 0.5 to 1.6 mTorr without ion bombardment, 4πMs decreased to less than 20 kG and Hc increased to about 20 Oe. The SEM micrographs of these films deposited at higher PAr showed the columnar structure. On the other hand, the films deposited at Yower PAr and ones bombarded by argon ions with proper kinetic energy during deposition did not present any texture and exhibited better soft magnetism. Such a morphology may be attributed to the difference in arrival energy of sputtered Fe particles to film surface and related closely to soft magnetism. It has been found that the dual ion beam sputtering method can control 4πMs and Hc with changing PAr and so prepare Fe films with superior soft magnetism by adjusting the kinetic energy of bombarding argon ions at lower PAr.

Development of an ion-beam sputtering system for depositing thin films and multilayers of alloys and compounds

2003 ◽  
Vol 205 (1-4) ◽  
pp. 309-322 ◽  
Author(s):  
Mukul Gupta ◽  
Ajay Gupta ◽  
D.M Phase ◽  
S.M Chaudhari ◽  
B.A Dasannacharya
Keyword(s):  
Thin Films ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Alloys And Compounds ◽  
Sputtering System

Deposition Characteristics of AlN Thin Film Prepared by the Dual Ion Beam Sputtering System

2006 ◽  
Vol 36 (1) ◽  
pp. 81-87 ◽  
Author(s):  
T. L. Hu ◽  
S. W. Mao ◽  
C. P. Chao ◽  
M. F. Wu ◽  
H. L. Huang ◽  
...  
Keyword(s):  
Thin Film ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Dual Ion Beam Sputtering ◽  
Sputtering System
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