scholarly journals Systematic study on work-function-shift in metal/Hf-based high-k gate stacks

2009 ◽  
Vol 94 (12) ◽  
pp. 122905 ◽  
Author(s):  
Yuki Kita ◽  
Shinichi Yoshida ◽  
Takuji Hosoi ◽  
Takayoshi Shimura ◽  
Kenji Shiraishi ◽  
...  
Keyword(s):  
Work Function ◽  
Systematic Study ◽  
Gate Stacks ◽  
High K

Bottom-up method for work function tuning in high-k/metal gate stacks in advanced CMOS technologies

2011 ◽  
Author(s):  
Mrunal A. Khaderbad ◽  
Rohit Pandharipande ◽  
Aradhana Gautam ◽  
Abhishek Mishra ◽  
Meenakshi Bhaisare ◽  
...  
Keyword(s):  
Work Function ◽  
Gate Stacks ◽  
Metal Gate ◽  
Bottom Up ◽  
High K ◽  
Work Function Tuning

scholarly journals Low-Frequency Noise Assessment of Work Function Engineering Cap Layers in High-k Gate Stacks

2019 ◽  
Vol 8 (2) ◽  
pp. N25-N31 ◽  
Author(s):  
C. Claeys ◽  
R. Ritzenthaler ◽  
T. Schram ◽  
H. Arimura ◽  
N. Horiguchi ◽  
...  
Keyword(s):  
Work Function ◽  
Low Frequency ◽  
Frequency Noise ◽  
Low Frequency Noise ◽  
Gate Stacks ◽  
High K ◽  
Noise Assessment

Systematic study of interfacial reactions induced by metal electrodes in high-k/InGaAs gate stacks

2016 ◽  
Vol 109 (17) ◽  
pp. 172101 ◽  
Author(s):  
S. Yoshida ◽  
D. Lin ◽  
A. Vais ◽  
A. Alian ◽  
J. Franco ◽  
...  
Keyword(s):  
Systematic Study ◽  
Interfacial Reactions ◽  
Gate Stacks ◽  
Metal Electrodes ◽  
High K

Work Function Control on High K Metal Gate Stacks

2019 ◽  
Vol 25 (6) ◽  
pp. 33-48 ◽  
Author(s):  
John Robertson
Keyword(s):  
Work Function ◽  
Gate Stacks ◽  
Metal Gate ◽  
High K

The effects of process condition of top-TiN and TaN thickness on the effective work function of MOSCAP with high-k/metal gate stacks

2014 ◽  
Vol 35 (10) ◽  
pp. 106002 ◽  
Author(s):  
Xueli Ma ◽  
Hong Yang ◽  
Wenwu Wang ◽  
Huaxiang Yin ◽  
Huilong Zhu ◽  
...  
Keyword(s):  
Work Function ◽  
Process Condition ◽  
Gate Stacks ◽  
Metal Gate ◽  
Effective Work ◽  
Effective Work Function ◽  
High K

Fundamental Aspects of Effective Work Function Instability of Metal/Hf-based High-k Gate Stacks

2019 ◽  
Vol 16 (5) ◽  
pp. 27-38
Author(s):  
Heiji Watanabe ◽  
Shinichi Yoshida ◽  
Yuki Kita ◽  
Takuji Hosoi ◽  
Takayoshi Shimura ◽  
...  
Keyword(s):  
Work Function ◽  
Gate Stacks ◽  
Effective Work ◽  
Effective Work Function ◽  
High K
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