Work Function Control on High K Metal Gate Stacks

2019 ◽  
Vol 25 (6) ◽  
pp. 33-48 ◽  
Author(s):  
John Robertson
Keyword(s):  
Work Function ◽  
Gate Stacks ◽  
Metal Gate ◽  
High K

Bottom-up method for work function tuning in high-k/metal gate stacks in advanced CMOS technologies

2011 ◽  
Author(s):  
Mrunal A. Khaderbad ◽  
Rohit Pandharipande ◽  
Aradhana Gautam ◽  
Abhishek Mishra ◽  
Meenakshi Bhaisare ◽  
...  
Keyword(s):  
Work Function ◽  
Gate Stacks ◽  
Metal Gate ◽  
Bottom Up ◽  
High K ◽  
Work Function Tuning

The effects of process condition of top-TiN and TaN thickness on the effective work function of MOSCAP with high-k/metal gate stacks

2014 ◽  
Vol 35 (10) ◽  
pp. 106002 ◽  
Author(s):  
Xueli Ma ◽  
Hong Yang ◽  
Wenwu Wang ◽  
Huaxiang Yin ◽  
Huilong Zhu ◽  
...  
Keyword(s):  
Work Function ◽  
Process Condition ◽  
Gate Stacks ◽  
Metal Gate ◽  
Effective Work ◽  
Effective Work Function ◽  
High K

scholarly journals Systematic study on work-function-shift in metal/Hf-based high-k gate stacks

2009 ◽  
Vol 94 (12) ◽  
pp. 122905 ◽  
Author(s):  
Yuki Kita ◽  
Shinichi Yoshida ◽  
Takuji Hosoi ◽  
Takayoshi Shimura ◽  
Kenji Shiraishi ◽  
...  
Keyword(s):  
Work Function ◽  
Systematic Study ◽  
Gate Stacks ◽  
High K

Enhanced degradation of n-MOSFETs with high-k/metal gate stacks under channel hot-carrier/gate-induced drain leakage alternating stress

2012 ◽  
Vol 52 (9-10) ◽  
pp. 1901-1904 ◽  
Author(s):  
Dongwoo Kim ◽  
Seonhaeng Lee ◽  
Cheolgyu Kim ◽  
Chiho Lee ◽  
Jeongsoo Park ◽  
...  
Keyword(s):  
Gate Stacks ◽  
Metal Gate ◽  
Hot Carrier ◽  
High K ◽  
Enhanced Degradation

Interplay between Dry Etch and Wet Clean in Patterning La2O3/HfO2 Containing High-k/metal Gate Stacks

2019 ◽  
Vol 25 (5) ◽  
pp. 29-36
Author(s):  
Ingrid Vos ◽  
David Hellin ◽  
Christa Vrancken ◽  
Jef Geypen ◽  
Hugo Bender ◽  
...  
Keyword(s):  
Gate Stacks ◽  
Metal Gate ◽  
High K ◽  
Dry Etch
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