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Fundamental Aspects of Effective Work Function Instability of Metal/Hf-based High-k Gate Stacks
ECS Transactions
◽
10.1149/1.2981585
◽
2019
◽
Vol 16
(5)
◽
pp. 27-38
Author(s):
Heiji Watanabe
◽
Shinichi Yoshida
◽
Yuki Kita
◽
Takuji Hosoi
◽
Takayoshi Shimura
◽
...
Keyword(s):
Work Function
◽
Gate Stacks
◽
Effective Work
◽
Effective Work Function
◽
High K
Download Full-text
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The effects of process condition of top-TiN and TaN thickness on the effective work function of MOSCAP with high-k/metal gate stacks
Journal of Semiconductors
◽
10.1088/1674-4926/35/10/106002
◽
2014
◽
Vol 35
(10)
◽
pp. 106002
◽
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◽
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◽
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◽
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◽
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Keyword(s):
Work Function
◽
Process Condition
◽
Gate Stacks
◽
Metal Gate
◽
Effective Work
◽
Effective Work Function
◽
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Fluorine implantation for effective work function control in p-type metal-oxide-semiconductor high-k metal gate stacks
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
◽
10.1116/1.3521471
◽
2011
◽
Vol 29
(1)
◽
pp. 01A905
◽
Cited By ~ 1
Author(s):
A. Fet
◽
V. Häublein
◽
A. J. Bauer
◽
H. Ryssel
◽
L. Frey
Keyword(s):
Metal Oxide
◽
Work Function
◽
Metal Oxide Semiconductor
◽
Oxide Semiconductor
◽
Gate Stacks
◽
Metal Gate
◽
Effective Work
◽
Effective Work Function
◽
High K
◽
P Type
Download Full-text
Fundamental Aspects of Effective Work Function Instability of Metal/Hf-based High-k Gate Stacks
ECS Meeting Abstracts
◽
10.1149/ma2008-02/25/1923
◽
2008
◽
Keyword(s):
Work Function
◽
Gate Stacks
◽
Effective Work
◽
Effective Work Function
◽
High K
Download Full-text
Impact of chemical bonding difference of ALD Mo on SiO2 and Al2O3 on the effective work function of the two gate stacks
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
◽
10.1116/6.0000964
◽
2021
◽
Vol 39
(4)
◽
pp. 043201
Author(s):
Ekaterina Zoubenko
◽
Sara Iacopetti
◽
Kamira Weinfeld
◽
Yaron Kauffmann
◽
Patrick Van Cleemput
◽
...
Keyword(s):
Work Function
◽
Chemical Bonding
◽
Gate Stacks
◽
Effective Work
◽
Effective Work Function
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Enabling Effective Work Function Tuning by RFPVD Metal Oxide on High-k Gate Dielectric
ECS Meeting Abstracts
◽
10.1149/ma2008-01/16/632
◽
2008
◽
Keyword(s):
Metal Oxide
◽
Work Function
◽
Gate Dielectric
◽
Effective Work
◽
Effective Work Function
◽
High K
◽
Work Function Tuning
◽
High K Gate Dielectric
Download Full-text
Evaluation of Effective Work Function of Pt on Bi-layer High-k/SiO2 Stack Structure using by Backside X-ray Photoelectron Spectroscopy
10.7567/ssdm.2009.b-1-5
◽
2009
◽
Cited By ~ 1
Author(s):
T. Mori
◽
A. Ohta
◽
H. Murakami
◽
S. Higashi
◽
S. Miyazaki
Keyword(s):
Work Function
◽
Photoelectron Spectroscopy
◽
X Ray
◽
Effective Work
◽
Effective Work Function
◽
High K
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Effective Work Function Engineering for Aggressively Scaled Planar and FinFET-based Devices with High-k Last Replacement Metal Gate Tech.
10.7567/ssdm.2012.d-1-2
◽
2012
◽
Author(s):
A. Veloso
◽
S. A. Chew
◽
Y. Higuchi
◽
L. A. Ragnarsson
◽
E. Simoen
◽
...
Keyword(s):
Work Function
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Metal Gate
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Effective Work
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Effective Work Function
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High K
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In depth analysis of dopant effect on high-k metal gate effective work function
2012 13th International Conference on Ultimate Integration on Silicon (ULIS)
◽
10.1109/ulis.2012.6193345
◽
2012
◽
Cited By ~ 1
Author(s):
C. Leroux
◽
S. Baudot
◽
M. Charbonnier
◽
A. Van Deer Geest
◽
P. Caubet
◽
...
Keyword(s):
Work Function
◽
Metal Gate
◽
Dopant Effect
◽
Effective Work
◽
Effective Work Function
◽
High K
◽
Depth Analysis
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Comprehensive study and control of oxygen vacancy induced effective work function modulation in gate-first high-k/metal inserted poly-Si stacks
2010 Symposium on VLSI Technology
◽
10.1109/vlsit.2010.5556218
◽
2010
◽
Author(s):
T. Hosoi
◽
M. Saeki
◽
Y. Oku
◽
H. Arimura
◽
N. Kitano
◽
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Keyword(s):
Oxygen Vacancy
◽
Work Function
◽
Effective Work
◽
Effective Work Function
◽
High K
◽
And Control
◽
Comprehensive Study
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Determining factor of effective work function in metal/bi-layer high-k gate stack structure studied by photoemission spectroscopy
Applied Physics Letters
◽
10.1063/1.3695166
◽
2012
◽
Vol 100
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◽
pp. 112906
◽
Cited By ~ 3
Author(s):
S. Toyoda
◽
H. Kumigashira
◽
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◽
H. Sugaya
◽
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Keyword(s):
Work Function
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Photoemission Spectroscopy
◽
Gate Stack
◽
Effective Work
◽
Effective Work Function
◽
High K
◽
Determining Factor
Download Full-text
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